Legal Representation
Attorney
KYU MIN
USPTO Deadlines
Application History
26 events| Date | Code | Type | Description | Documents |
|---|---|---|---|---|
| Sep 7, 2024 | ETOP | T | EXTENSION OF TIME TO OPPOSE PROCESS - TERMINATED | Loading... |
| Sep 6, 2024 | OP.I | T | OPPOSITION INSTITUTED NO. 999999 | Loading... |
| Aug 6, 2024 | ETOF | T | EXTENSION OF TIME TO OPPOSE RECEIVED | Loading... |
| Jul 9, 2024 | NPUB | E | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED | Loading... |
| Jul 9, 2024 | PUBO | A | PUBLISHED FOR OPPOSITION | Loading... |
| Jun 19, 2024 | NONP | E | NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED | Loading... |
| Jun 5, 2024 | CNSA | P | APPROVED FOR PUB - PRINCIPAL REGISTER | Loading... |
| Jun 5, 2024 | XAEC | I | EXAMINER'S AMENDMENT ENTERED | Loading... |
| Jun 5, 2024 | GNEN | O | NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED | Loading... |
| Jun 5, 2024 | GNEA | F | EXAMINERS AMENDMENT E-MAILED | Loading... |
| Jun 5, 2024 | CNEA | R | EXAMINERS AMENDMENT -WRITTEN | Loading... |
| May 17, 2024 | GNRN | O | NOTIFICATION OF NON-FINAL ACTION E-MAILED | Loading... |
| May 17, 2024 | GNRT | F | NON-FINAL ACTION E-MAILED | Loading... |
| May 17, 2024 | CNRT | R | NON-FINAL ACTION WRITTEN | Loading... |
| May 10, 2024 | ZZZX | Z | PREVIOUS ALLOWANCE COUNT WITHDRAWN | Loading... |
| Mar 26, 2024 | PBCR | Z | WITHDRAWN FROM PUB - OG REVIEW QUERY | Loading... |
| Mar 11, 2024 | CNSA | P | APPROVED FOR PUB - PRINCIPAL REGISTER | Loading... |
| Mar 8, 2024 | TEME | I | TEAS/EMAIL CORRESPONDENCE ENTERED | Loading... |
| Mar 8, 2024 | CRFA | I | CORRESPONDENCE RECEIVED IN LAW OFFICE | Loading... |
| Mar 8, 2024 | TROA | I | TEAS RESPONSE TO OFFICE ACTION RECEIVED | Loading... |
| Jan 19, 2024 | GNRN | O | NOTIFICATION OF NON-FINAL ACTION E-MAILED | Loading... |
| Jan 19, 2024 | GNRT | F | NON-FINAL ACTION E-MAILED | Loading... |
| Jan 19, 2024 | CNRT | R | NON-FINAL ACTION WRITTEN | Loading... |
| Nov 30, 2023 | DOCK | D | ASSIGNED TO EXAMINER | Loading... |
| May 25, 2023 | NWOS | I | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED | Loading... |
| May 1, 2023 | NWAP | I | NEW APPLICATION ENTERED | Loading... |
Detailed Classifications
Class 007
Machines for semiconductor processing / manufacturing; Machines for thin film deposition; Semiconductor chip manufacturing equipment, namely, semiconductor chip manufacturing machines; Semiconductor wafer processing equipment; Semiconductor manufacturing machines, namely, chemical vapor deposition (CVD) reactors, plasma-enhanced chemical vapor deposition (PECVD) reactors, atomic layer deposition (ALD) reactors or atomic vapor deposition (AVD) reactors and component parts of CVD, PECVD, ALD or AVD reactors, namely, injection apparatus and instruments for liquid or gaseous substances for the manufacture of semiconductors; Machines for the production of semiconductors; Robots, vacuum systems, motors and engines, drive units, and parts of machines for operating semiconductor manufacturing machines; Injection machines for use in manufacturing semiconductors for injection of liquid or gaseous material and not for medical purposes; Metal organic vapor deposition equipment, namely, vapor deposition apparatus for semiconductor processing machines, and chemical vapor deposition apparatus for use in manufacturing semiconductors
Class 009
Recorded computers software for semiconductor processing or for thin film deposition; Semiconductor testing apparatus; Downloadable computer software for use in processing semiconductor wafers; Electronic semiconductor control, checking and measuring devices, namely, computer hardware and recorded computer software for use in measuring, checking and controlling thin film growth or deposition on wafer surfaces and wafer surface temperatures of individual semiconductor wafers; Semiconductors; Downloadable computer control software for use in operating semiconductor manufacturing machines and installations for chemical vapor deposition (CVD) reactors, plasma-enhanced chemical vapor deposition (PECVD) reactors, atomic layer deposition (ALD) reactors or atomic vapor deposition (AVD) reactors for deposition of thin films onto surfaces; Downloadable computer operating system software for use in operating semiconductor manufacturing machines and installations for chemical and/or plasma enhanced vapor deposition of polymers onto surfaces; Electronic controllers and measuring devices used with semiconductor manufacturing machines and installations for chemical and/or plasma enhanced vapor deposition of polymers onto surfaces
Class 011
Industrial apparatus using air to assist in the drying and cleaning of components in the semiconductor industry
Class 040
Processing of semiconductors or deposition of thin films on substrates; Consulting services pertaining to the material transformation of the surface of industrial products relating to chemical and/or plasma-enhanced vapor deposition, in particular in relation to the operation of machines and installations for chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films onto surfaces
Class 042
Scientific, technological, and industrial research and development services for semiconductor processing or deposition of thin films on substrates; Scientific and technological services, namely, research and design in the field of material transformation of the surface of industrial products relating to chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films, in particular in relation to the operation of machines and installations for CVD, PECVD, ALD and AVD of thin films onto surfaces; Industrial research in the field of material transformation of the surface of industrial products relating chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films, in particular in relation to the operation of machines and installations for chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films onto surfaces; Design and development of computer hardware and software, in particular for operating machines and installations for chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films onto surfaces; Technical consulting in the field of new product design and development, namely, in the field of chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films, in particular in relation to the design of machines and installations for chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films
Classification
International Classes
007
009
011
040
042