QXP

Serial Number 97911161
774

Registration Progress

Application Filed
Apr 27, 2023
Under Examination
Approved for Publication
Jul 9, 2024
Published for Opposition
Jul 9, 2024
Registered

Trademark Image

QXP

Basic Information

Serial Number
97911161
Filing Date
April 27, 2023
Published for Opposition
July 9, 2024
Drawing Code
4

Status Summary

Current Status
Active
Status Code
774
Status Date
Sep 6, 2024
Application
Pending
Classes
007 009 011 040
+1 more

Rights Holder

Eugenus, Inc.

03
Address
677 River Oaks Parkway
San Jose, CA 95134

Ownership History

Eugenus, Inc.

Original Applicant
03
San Jose, CA

Eugenus, Inc.

Owner at Publication
03
San Jose, CA

Legal Representation

Attorney
KYU MIN

USPTO Deadlines

No Upcoming Deadlines

No upcoming deadlines found for this trademark.

Application History

26 events
Date Code Type Description Documents
Sep 7, 2024 ETOP T EXTENSION OF TIME TO OPPOSE PROCESS - TERMINATED Loading...
Sep 6, 2024 OP.I T OPPOSITION INSTITUTED NO. 999999 Loading...
Aug 6, 2024 ETOF T EXTENSION OF TIME TO OPPOSE RECEIVED Loading...
Jul 9, 2024 NPUB E OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED Loading...
Jul 9, 2024 PUBO A PUBLISHED FOR OPPOSITION Loading...
Jun 19, 2024 NONP E NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED Loading...
Jun 5, 2024 CNSA P APPROVED FOR PUB - PRINCIPAL REGISTER Loading...
Jun 5, 2024 XAEC I EXAMINER'S AMENDMENT ENTERED Loading...
Jun 5, 2024 GNEN O NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED Loading...
Jun 5, 2024 GNEA F EXAMINERS AMENDMENT E-MAILED Loading...
Jun 5, 2024 CNEA R EXAMINERS AMENDMENT -WRITTEN Loading...
May 17, 2024 GNRN O NOTIFICATION OF NON-FINAL ACTION E-MAILED Loading...
May 17, 2024 GNRT F NON-FINAL ACTION E-MAILED Loading...
May 17, 2024 CNRT R NON-FINAL ACTION WRITTEN Loading...
May 10, 2024 ZZZX Z PREVIOUS ALLOWANCE COUNT WITHDRAWN Loading...
Mar 26, 2024 PBCR Z WITHDRAWN FROM PUB - OG REVIEW QUERY Loading...
Mar 11, 2024 CNSA P APPROVED FOR PUB - PRINCIPAL REGISTER Loading...
Mar 8, 2024 TEME I TEAS/EMAIL CORRESPONDENCE ENTERED Loading...
Mar 8, 2024 CRFA I CORRESPONDENCE RECEIVED IN LAW OFFICE Loading...
Mar 8, 2024 TROA I TEAS RESPONSE TO OFFICE ACTION RECEIVED Loading...
Jan 19, 2024 GNRN O NOTIFICATION OF NON-FINAL ACTION E-MAILED Loading...
Jan 19, 2024 GNRT F NON-FINAL ACTION E-MAILED Loading...
Jan 19, 2024 CNRT R NON-FINAL ACTION WRITTEN Loading...
Nov 30, 2023 DOCK D ASSIGNED TO EXAMINER Loading...
May 25, 2023 NWOS I NEW APPLICATION OFFICE SUPPLIED DATA ENTERED Loading...
May 1, 2023 NWAP I NEW APPLICATION ENTERED Loading...

Detailed Classifications

Class 007
Machines for semiconductor processing / manufacturing; Machines for thin film deposition; Semiconductor chip manufacturing equipment, namely, semiconductor chip manufacturing machines; Semiconductor wafer processing equipment; Semiconductor manufacturing machines, namely, chemical vapor deposition (CVD) reactors, plasma-enhanced chemical vapor deposition (PECVD) reactors, atomic layer deposition (ALD) reactors or atomic vapor deposition (AVD) reactors and component parts of CVD, PECVD, ALD or AVD reactors, namely, injection apparatus and instruments for liquid or gaseous substances for the manufacture of semiconductors; Machines for the production of semiconductors; Robots, vacuum systems, motors and engines, drive units, and parts of machines for operating semiconductor manufacturing machines; Injection machines for use in manufacturing semiconductors for injection of liquid or gaseous material and not for medical purposes; Metal organic vapor deposition equipment, namely, vapor deposition apparatus for semiconductor processing machines, and chemical vapor deposition apparatus for use in manufacturing semiconductors
Class 009
Recorded computers software for semiconductor processing or for thin film deposition; Semiconductor testing apparatus; Downloadable computer software for use in processing semiconductor wafers; Electronic semiconductor control, checking and measuring devices, namely, computer hardware and recorded computer software for use in measuring, checking and controlling thin film growth or deposition on wafer surfaces and wafer surface temperatures of individual semiconductor wafers; Semiconductors; Downloadable computer control software for use in operating semiconductor manufacturing machines and installations for chemical vapor deposition (CVD) reactors, plasma-enhanced chemical vapor deposition (PECVD) reactors, atomic layer deposition (ALD) reactors or atomic vapor deposition (AVD) reactors for deposition of thin films onto surfaces; Downloadable computer operating system software for use in operating semiconductor manufacturing machines and installations for chemical and/or plasma enhanced vapor deposition of polymers onto surfaces; Electronic controllers and measuring devices used with semiconductor manufacturing machines and installations for chemical and/or plasma enhanced vapor deposition of polymers onto surfaces
Class 011
Industrial apparatus using air to assist in the drying and cleaning of components in the semiconductor industry
Class 040
Processing of semiconductors or deposition of thin films on substrates; Consulting services pertaining to the material transformation of the surface of industrial products relating to chemical and/or plasma-enhanced vapor deposition, in particular in relation to the operation of machines and installations for chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films onto surfaces
Class 042
Scientific, technological, and industrial research and development services for semiconductor processing or deposition of thin films on substrates; Scientific and technological services, namely, research and design in the field of material transformation of the surface of industrial products relating to chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films, in particular in relation to the operation of machines and installations for CVD, PECVD, ALD and AVD of thin films onto surfaces; Industrial research in the field of material transformation of the surface of industrial products relating chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films, in particular in relation to the operation of machines and installations for chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films onto surfaces; Design and development of computer hardware and software, in particular for operating machines and installations for chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films onto surfaces; Technical consulting in the field of new product design and development, namely, in the field of chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films, in particular in relation to the design of machines and installations for chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films

Classification

International Classes
007 009 011 040 042