ATOMIC LAYER POLISH

Serial Number 97108455
Registration 7289530
700

Registration Progress

Application Filed
Nov 4, 2021
Under Examination
Approved for Publication
Published for Opposition
Registered
Jan 23, 2024

Trademark Image

ATOMIC LAYER POLISH

Basic Information

Serial Number
97108455
Registration Number
7289530
Filing Date
November 4, 2021
Registration Date
January 23, 2024
Drawing Code
4

Status Summary

Current Status
Active
Status Code
700
Status Date
Jan 23, 2024
Registration
Registered
Classes
042

Rights Holder

NanoClear Technologies, Inc.

03
Address
145 N. Altadena Dr.
Pasadena, CA 91107

Ownership History

NanoClear Technologies, Inc.

Original Applicant
03
Pasadena, CA

NanoClear Technologies, Inc.

Original Registrant
03
Pasadena, CA

Legal Representation

Attorney
Laila Wolfgram

Application History

41 events
Date Code Type Description Documents
Jun 4, 2024 REAP I TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED Loading...
Jun 4, 2024 TCCA I TEAS CHANGE OF CORRESPONDENCE RECEIVED Loading...
Jun 4, 2024 ARAA I ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED Loading...
May 29, 2024 REAP I TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED Loading...
May 29, 2024 CHAN I APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED Loading...
May 29, 2024 TCCA I TEAS CHANGE OF CORRESPONDENCE RECEIVED Loading...
May 29, 2024 COAR I TEAS CHANGE OF OWNER ADDRESS RECEIVED Loading...
May 29, 2024 ARAA I ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED Loading...
Jan 23, 2024 NRCS E NOTICE OF REGISTRATION CONFIRMATION EMAILED Loading...
Jan 23, 2024 NRCS E NOTICE OF REGISTRATION CONFIRMATION EMAILED Loading...
Jan 23, 2024 R.SR A REGISTERED-SUPPLEMENTAL REGISTER Loading...
Sep 21, 2023 AAUA E NOTICE OF ACCEPTANCE OF AMENDMENT TO ALLEGE USE E-MAILED Loading...
Sep 20, 2023 IUAA P USE AMENDMENT ACCEPTED Loading...
Sep 20, 2023 CNTA O APPROVED FOR REGISTRATION SUPPLEMENTAL REGISTER Loading...
Sep 19, 2023 IUAF S USE AMENDMENT FILED Loading...
Sep 19, 2023 AUPC I AMENDMENT TO USE PROCESSING COMPLETE Loading...
Sep 18, 2023 CRFA I CORRESPONDENCE RECEIVED IN LAW OFFICE Loading...
Sep 18, 2023 TROA I TEAS RESPONSE TO OFFICE ACTION RECEIVED Loading...
Sep 18, 2023 TEME I TEAS/EMAIL CORRESPONDENCE ENTERED Loading...
Sep 18, 2023 EAAU I TEAS AMENDMENT OF USE RECEIVED Loading...
Jun 14, 2023 XELG O APPLICATION EXTENSION GRANTED/RECEIPT PROVIDED Loading...
Jun 14, 2023 XELR I APPLICATION EXTENSION TO RESPONSE PERIOD - RECEIVED Loading...
Mar 16, 2023 GNRT O NON-FINAL ACTION E-MAILED Loading...
Mar 16, 2023 GNRT O NON-FINAL ACTION E-MAILED Loading...
Mar 16, 2023 GNRN O NOTIFICATION OF NON-FINAL ACTION E-MAILED Loading...
Mar 16, 2023 GNRN O NOTIFICATION OF NON-FINAL ACTION E-MAILED Loading...
Mar 16, 2023 CNRT R NON-FINAL ACTION WRITTEN Loading...
Mar 16, 2023 CNRT R NON-FINAL ACTION WRITTEN Loading...
Feb 21, 2023 CRFA I CORRESPONDENCE RECEIVED IN LAW OFFICE Loading...
Feb 21, 2023 TROA I TEAS RESPONSE TO OFFICE ACTION RECEIVED Loading...
Feb 21, 2023 TEME I TEAS/EMAIL CORRESPONDENCE ENTERED Loading...
Feb 17, 2023 EWAF I TEAS WITHDRAWAL OF ATTORNEY RECEIVED-FIRM RETAINS Loading...
Feb 17, 2023 REAP I TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED Loading...
Feb 17, 2023 TCCA I TEAS CHANGE OF CORRESPONDENCE RECEIVED Loading...
Feb 17, 2023 ARAA I ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED Loading...
Aug 24, 2022 GNRN O NOTIFICATION OF NON-FINAL ACTION E-MAILED Loading...
Aug 24, 2022 GNRT F NON-FINAL ACTION E-MAILED Loading...
Aug 24, 2022 CNRT R NON-FINAL ACTION WRITTEN Loading...
Aug 15, 2022 DOCK D ASSIGNED TO EXAMINER Loading...
Nov 15, 2021 NWOS I NEW APPLICATION OFFICE SUPPLIED DATA ENTERED Loading...
Nov 8, 2021 NWAP I NEW APPLICATION ENTERED Loading...

Detailed Classifications

Class 042
Engineering services in the field of physical and chemical vapor deposition systems; product design and development of systems used for thin film deposition, etching and cleaning for others; product design and development of physical and chemical vapor deposition systems for others; engineering services in the field of systems used for thin film deposition, etching and cleaning; mechanical and chemical engineering services
First Use Anywhere: Jan 26, 2021
First Use in Commerce: Jan 26, 2021

Classification

International Classes
042