RETICLE

Serial Number 90690129
Registration 7031881
700

Registration Progress

Application Filed
May 4, 2021
Under Examination
Oct 11, 2022
Approved for Publication
Aug 16, 2022
Published for Opposition
Aug 16, 2022
Registered
Apr 18, 2023

Trademark Image

RETICLE

Basic Information

Serial Number
90690129
Registration Number
7031881
Filing Date
May 4, 2021
Registration Date
April 18, 2023
Published for Opposition
August 16, 2022
Drawing Code
4

Status Summary

Current Status
Active
Status Code
700
Status Date
Apr 18, 2023
Registration
Registered
Classes
007 042

Rights Holder

Angstrom Engineering Inc.

03
Address
91 Trillium Drive
Kitchener, Ontario N2E1W8
CA

Ownership History

Angstrom Engineering Inc.

Original Applicant
03
Kitchener, Ontario CA

Angstrom Engineering Inc.

Owner at Publication
03
Kitchener, Ontario CA

Angstrom Engineering Inc.

Original Registrant
03
Kitchener, Ontario CA

Legal Representation

Attorney
Susan M. Natland

USPTO Deadlines

Next Deadline
1204 days remaining
Section 8 Declaration Due (Principal Register) (Based on registration date 20230418)
Due Date
April 18, 2029
Grace Period Ends
October 18, 2029
Additional deadlines exist. Contact your attorney for complete deadline information.

Application History

35 events
Date Code Type Description Documents
Nov 26, 2025 EWAF I TEAS WITHDRAWAL OF ATTORNEY RECEIVED-FIRM RETAINS Loading...
Nov 26, 2025 TCCA I TEAS CHANGE OF CORRESPONDENCE RECEIVED Loading...
Nov 26, 2025 ECDR I TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS Loading...
Nov 26, 2025 ARAA I ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED Loading...
Nov 26, 2025 REAP I TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED Loading...
Nov 26, 2025 CHAN I APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED Loading...
Nov 26, 2025 COAR I TEAS CHANGE OF OWNER ADDRESS RECEIVED Loading...
Apr 18, 2023 NRCC E NOTICE OF REGISTRATION CONFIRMATION EMAILED Loading...
Apr 18, 2023 R.PR A REGISTERED-PRINCIPAL REGISTER Loading...
Mar 17, 2023 SUNA E NOTICE OF ACCEPTANCE OF STATEMENT OF USE E-MAILED Loading...
Mar 16, 2023 CNPR P ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED Loading...
Jan 4, 2023 GNRN O NOTIFICATION OF NON-FINAL ACTION E-MAILED Loading...
Jan 4, 2023 GNRT O NON-FINAL ACTION E-MAILED Loading...
Jan 4, 2023 CNRT W SU - NON-FINAL ACTION - WRITTEN Loading...
Nov 28, 2022 SUPC I STATEMENT OF USE PROCESSING COMPLETE Loading...
Nov 8, 2022 IUAF S USE AMENDMENT FILED Loading...
Nov 28, 2022 AITU A CASE ASSIGNED TO INTENT TO USE PARALEGAL Loading...
Nov 8, 2022 EISU I TEAS STATEMENT OF USE RECEIVED Loading...
Oct 11, 2022 NOAM E NOA E-MAILED - SOU REQUIRED FROM APPLICANT Loading...
Aug 16, 2022 NPUB E OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED Loading...
Aug 16, 2022 PUBO A PUBLISHED FOR OPPOSITION Loading...
Jul 27, 2022 NONP E NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED Loading...
Jul 13, 2022 CNSA P APPROVED FOR PUB - PRINCIPAL REGISTER Loading...
Jun 16, 2022 TEME I TEAS/EMAIL CORRESPONDENCE ENTERED Loading...
Jun 15, 2022 CRFA I CORRESPONDENCE RECEIVED IN LAW OFFICE Loading...
Jun 15, 2022 TROA I TEAS RESPONSE TO OFFICE ACTION RECEIVED Loading...
Dec 16, 2021 GNRN O NOTIFICATION OF NON-FINAL ACTION E-MAILED Loading...
Dec 16, 2021 GNRT F NON-FINAL ACTION E-MAILED Loading...
Dec 16, 2021 CNRT R NON-FINAL ACTION WRITTEN Loading...
Dec 14, 2021 DOCK D ASSIGNED TO EXAMINER Loading...
Aug 12, 2021 AMPX O PRELIMINARY/VOLUNTARY AMENDMENT - ENTERED Loading...
Aug 12, 2021 ALIE A ASSIGNED TO LIE Loading...
Jun 1, 2021 PARI I TEAS VOLUNTARY AMENDMENT RECEIVED Loading...
Aug 7, 2021 NWOS I NEW APPLICATION OFFICE SUPPLIED DATA ENTERED Loading...
May 7, 2021 NWAP I NEW APPLICATION ENTERED Loading...

Detailed Classifications

Class 007
Physical and chemical vapor deposition systems, namely, machines used for sputter deposition, electron beam evaporation, thermal evaporation, ion beam deposition, ion beam sputter deposition, ion assisted deposition, pulsed laser deposition, atomic layer deposition
First Use Anywhere: 20161200
First Use in Commerce: 20170700
Class 042
Designing and engineering physical and chemical vapor deposition systems for others
First Use Anywhere: 20161200
First Use in Commerce: 20170700

Classification

International Classes
007 042