Legal Representation
Attorney
Helen Hill Minsker
USPTO Deadlines
Next Deadline
332 days remaining
Section 8 (6-Year) Declaration Due (Based on registration date 2020-06-30)
Due Date
June 30, 2026
Grace Period Ends
December 30, 2026
Additional deadlines exist. Contact your attorney for complete deadline information.
Application History
21 events| Date | Code | Type | Description | Documents |
|---|---|---|---|---|
| Jun 30, 2025 | REM1 | E | COURTESY REMINDER - SEC. 8 (6-YR) E-MAILED | Loading... |
| Nov 23, 2020 | A7OK | O | AMENDMENT UNDER SECTION 7 - PROCESSED | Loading... |
| Nov 20, 2020 | APRE | A | CASE ASSIGNED TO POST REGISTRATION PARALEGAL | Loading... |
| Jul 30, 2020 | ES7R | I | TEAS SECTION 7 REQUEST RECEIVED | Loading... |
| Jul 15, 2020 | ASGN | I | AUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP | Loading... |
| Jun 30, 2020 | R.PR | A | REGISTERED-PRINCIPAL REGISTER | Loading... |
| Apr 14, 2020 | NPUB | E | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED | Loading... |
| Apr 14, 2020 | PUBO | A | PUBLISHED FOR OPPOSITION | Loading... |
| Mar 25, 2020 | NONP | E | NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED | Loading... |
| Mar 11, 2020 | FIXD | O | ELECTRONIC RECORD REVIEW COMPLETE | Loading... |
| Mar 6, 2020 | ERRR | O | ON HOLD - ELECTRONIC RECORD REVIEW REQUIRED | Loading... |
| Mar 1, 2020 | CNSA | O | APPROVED FOR PUB - PRINCIPAL REGISTER | Loading... |
| Feb 6, 2020 | TEME | I | TEAS/EMAIL CORRESPONDENCE ENTERED | Loading... |
| Feb 6, 2020 | CRFA | I | CORRESPONDENCE RECEIVED IN LAW OFFICE | Loading... |
| Feb 6, 2020 | TROA | I | TEAS RESPONSE TO OFFICE ACTION RECEIVED | Loading... |
| Dec 1, 2019 | GNRN | O | NOTIFICATION OF NON-FINAL ACTION E-MAILED | Loading... |
| Dec 1, 2019 | GNRT | F | NON-FINAL ACTION E-MAILED | Loading... |
| Dec 1, 2019 | CNRT | R | NON-FINAL ACTION WRITTEN | Loading... |
| Nov 22, 2019 | DOCK | D | ASSIGNED TO EXAMINER | Loading... |
| Sep 6, 2019 | NWOS | I | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED | Loading... |
| Aug 26, 2019 | NWAP | I | NEW APPLICATION ENTERED | Loading... |
Detailed Classifications
Class 001
Hydrophilic agents for industrial polishing; detergents for industrial use; chemicals
Class 003
Polishing pads; abrasive paper (sand paper); abrasive cloth; abrasive sand; polishing paper; polishing cloth; polishing preparations; semiconductor polishing slurries; electronic substrate polishing slurries; polishing slurries; abrasive preparations
Class 007
Work holding instruments for semiconductor wafer surface polishing machines and apparatus; templates for semiconductor wafer surface polishing machines and apparatus; blank components for semiconductor wafer surface polishing machines and apparatus; mounting films for semiconductor wafer surface polishing machines and apparatus; polishing pads for semiconductor wafer surface polishing machines and apparatus; conditioners used for polishing pads for semiconductor wafer surface polishing machines and apparatus; semiconductor wafer surface polishing machines and apparatus; parts and accessories of semiconductor wafer surface polishing machines and apparatus; semiconductor manufacturing machines and apparatus; work holding instruments for glass polishing machines and apparatus; templates for glass polishing machines and apparatus; blank templates for glass polishing machines and apparatus; mounting films for glass polishing machines and apparatus; polishing pads for glass polishing machines and apparatus; conditioners used for polishing pads for glass polishing machines and apparatus; glass polishing machines and apparatus; parts and accessories of glass polishing machines and apparatus; work holding instruments for glass substrate polishing machines and apparatus; templates for glass substrate polishing machines and apparatus; blank templates for glass substrate polishing machines and apparatus; mounting films for glass substrate polishing machines and apparatus; polishing pads for glass substrate polishing machines and apparatus; conditioners used for polishing pads for glass substrate polishing machines and apparatus; glass substrate polishing machines and apparatus; parts and accessories of glass substrate polishing machines and apparatus; work holding instruments for polishing machines and apparatus for manufacturing hard disks; templates for polishing machines and apparatus for manufacturing hard disks; blank templates for polishing machines and apparatus for manufacturing hard disks; mounting films for polishing machines and apparatus for manufacturing hard disks; polishing pads for polishing machines and apparatus for manufacturing hard disks; conditioners used for polishing pads for polishing machines and apparatus for manufacturing hard disks; polishing machines and apparatus for manufacturing hard disks; parts and accessories of polishing machines and apparatus for manufacturing hard disks; work holding instruments for electric polishing machines and apparatus; templates for electric polishing machines and apparatus; blank templates for electric polishing machines and apparatus; mounting films for electric polishing machines and apparatus; polishing pads for electric polishing machines and apparatus; conditioners used for polishing pads for electric polishing machines and apparatus; electric polishing machines and apparatus; parts and accessories of electric polishing machines and apparatus
Additional Information
Other
In the statement, line 1, "NITTA HAAS INCORPORATED" is deleted, and "NITTA DUPONT INCORPORATED" is inserted.
Classification
International Classes
001
003
007
Disclaimers
The following terms have been disclaimed and are not claimed as part of the trademark:
Specific Disclaimer
"ADVANCED SURFACE"