AE

Serial Number 88510050
Registration 6342345
700

Registration Progress

Application Filed
Jul 11, 2019
Under Examination
Sep 29, 2020
Approved for Publication
Aug 4, 2020
Published for Opposition
Aug 4, 2020
Registered
May 4, 2021

Trademark Image

AE

Basic Information

Serial Number
88510050
Registration Number
6342345
Filing Date
July 11, 2019
Registration Date
May 4, 2021
Published for Opposition
August 4, 2020
Drawing Code
5

Status Summary

Current Status
Active
Status Code
700
Status Date
May 4, 2021
Registration
Registered
Classes
001 007 040 042

Rights Holder

Angstrom Engineering Inc.

03
Address
91 Trillium Drive
Kitchener, Ontario N2E1W8
CA

Ownership History

Angstrom Engineering Inc.

Original Applicant
03
Kitchener, Ontario CA

Angstrom Engineering Inc.

Owner at Publication
03
Kitchener, Ontario CA

Angstrom Engineering Inc.

Original Registrant
03
Kitchener, Ontario CA

Legal Representation

Attorney
Susan M. Natland

USPTO Deadlines

Next Deadline
491 days remaining
Section 8 Declaration Due (Principal Register) (Based on registration date 20210504)
Due Date
May 04, 2027
Grace Period Ends
November 04, 2027
Additional deadlines exist. Contact your attorney for complete deadline information.

Application History

42 events
Date Code Type Description Documents
Nov 26, 2025 EWAF I TEAS WITHDRAWAL OF ATTORNEY RECEIVED-FIRM RETAINS Loading...
Nov 26, 2025 TCCA I TEAS CHANGE OF CORRESPONDENCE RECEIVED Loading...
Nov 26, 2025 ECDR I TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS Loading...
Nov 26, 2025 ARAA I ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED Loading...
Nov 26, 2025 REAP I TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED Loading...
Nov 26, 2025 CHAN I APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED Loading...
Nov 26, 2025 COAR I TEAS CHANGE OF OWNER ADDRESS RECEIVED Loading...
May 4, 2021 R.PR A REGISTERED-PRINCIPAL REGISTER Loading...
Apr 2, 2021 SUNA E NOTICE OF ACCEPTANCE OF STATEMENT OF USE E-MAILED Loading...
Apr 1, 2021 CNPR P ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED Loading...
Mar 30, 2021 SUPC I STATEMENT OF USE PROCESSING COMPLETE Loading...
Mar 9, 2021 IUAF S USE AMENDMENT FILED Loading...
Mar 29, 2021 AITU A CASE ASSIGNED TO INTENT TO USE PARALEGAL Loading...
Mar 9, 2021 EISU I TEAS STATEMENT OF USE RECEIVED Loading...
Sep 29, 2020 NOAM E NOA E-MAILED - SOU REQUIRED FROM APPLICANT Loading...
Aug 4, 2020 NPUB E OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED Loading...
Aug 4, 2020 PUBO A PUBLISHED FOR OPPOSITION Loading...
Jul 15, 2020 NONP E NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED Loading...
Jun 27, 2020 CNSA P APPROVED FOR PUB - PRINCIPAL REGISTER Loading...
Jun 27, 2020 TEME I TEAS/EMAIL CORRESPONDENCE ENTERED Loading...
Jun 27, 2020 CRFA I CORRESPONDENCE RECEIVED IN LAW OFFICE Loading...
Jun 25, 2020 ALIE A ASSIGNED TO LIE Loading...
Jun 15, 2020 ALIE A ASSIGNED TO LIE Loading...
Jun 11, 2020 ERSI I TEAS RESPONSE TO SUSPENSION INQUIRY RECEIVED Loading...
May 19, 2020 GNS3 O NOTIFICATION OF LETTER OF SUSPENSION E-MAILED Loading...
May 19, 2020 GNSL S LETTER OF SUSPENSION E-MAILED Loading...
May 19, 2020 CNSL R SUSPENSION LETTER WRITTEN Loading...
May 18, 2020 ZZZX Z PREVIOUS ALLOWANCE COUNT WITHDRAWN Loading...
May 18, 2020 PBMR Z WITHDRAWN FROM PUB - MANAGING ATTORNEY REQUEST Loading...
May 12, 2020 FIXD O ELECTRONIC RECORD REVIEW COMPLETE Loading...
May 8, 2020 ERRR O ON HOLD - ELECTRONIC RECORD REVIEW REQUIRED Loading...
May 4, 2020 ALIE A ASSIGNED TO LIE Loading...
Apr 27, 2020 CNSA P APPROVED FOR PUB - PRINCIPAL REGISTER Loading...
Mar 27, 2020 TEME I TEAS/EMAIL CORRESPONDENCE ENTERED Loading...
Mar 26, 2020 CRFA I CORRESPONDENCE RECEIVED IN LAW OFFICE Loading...
Mar 26, 2020 TROA I TEAS RESPONSE TO OFFICE ACTION RECEIVED Loading...
Sep 27, 2019 GNRN O NOTIFICATION OF NON-FINAL ACTION E-MAILED Loading...
Sep 27, 2019 GNRT F NON-FINAL ACTION E-MAILED Loading...
Sep 27, 2019 CNRT R NON-FINAL ACTION WRITTEN Loading...
Sep 26, 2019 DOCK D ASSIGNED TO EXAMINER Loading...
Jul 17, 2019 NWOS I NEW APPLICATION OFFICE SUPPLIED DATA ENTERED Loading...
Jul 15, 2019 NWAP I NEW APPLICATION ENTERED Loading...

Detailed Classifications

Class 001
Chemical source materials for the use in deposition systems for the deposition of thin films upon semiconductor wafers, semiconductor chips, optical components, and nanotechnology components in the manufacture of semi-conductors, computer peripherals, microscopy equipment, imaging equipment, interferometer instruments, optical instruments, light emitting diode displays, monitors and screens, liquid crystal displays, monitors and screens, batteries, photovoltaic devices, with the aforementioned chemical materials being derived from metals, non-metals, ceramics, oxides, nitrides, organic compounds and polymers
First Use Anywhere: Jun 23, 2011
First Use in Commerce: Jun 23, 2011
Class 007
Physical and chemical vapor deposition systems, namely, coating application machines used for sputter deposition, electron beam evaporation, thermal evaporation, ion beam deposition, ion beam sputter deposition, ion assisted deposition, pulsed laser deposition, and atomic layer deposition; vacuum equipment and systems comprised of vacuum machinery and vacuum pumps used for thin film deposition, etching and cleaning; deposition system components being parts of deposition machinery, namely, substrate tables, fixturing and carriers, thermal evaporation sources, namely, deposition boats, deposition filaments and crucibles, magnetron sputter sources, electron beam evaporators, nanoparticle generators, ion generators, ion accelerators, charged particle generators for material coating and surface modification purposes, sample handling arms and robots, load lock chambers, thin film thickness measurement equipment, optical measurement equipment, process gas delivery and abatement equipment, vacuum valves, vacuum pumps and pumping systems; vacuum equipment and systems comprised of vacuum machinery and vacuum pumps for use in controlled environment and space simulation
First Use Anywhere: Mar 13, 2008
First Use in Commerce: Mar 13, 2008
Class 040
Manufacturing of physical and chemical vapor deposition machinery systems to the order and specification of others; manufacturing vacuum equipment and systems used for thin film deposition, etching and cleaning to the order and specification of others; manufacturing vacuum equipment and systems used for controlled environment and space simulation to the order and specification of others
First Use Anywhere: Mar 13, 2008
First Use in Commerce: Mar 13, 2008
Class 042
Engineering services in the field of physical and chemical vapor deposition systems; engineering services in the field of vacuum equipment and systems used for thin film deposition, etching and cleaning; mechanical and chemical engineering services; engineering services in the field of vacuum equipment and systems used for controlled environment and space simulation; design and development of physical and chemical vapor deposition machinery systems; design and development of vacuum equipment and machinery systems used for thin film deposition, etching and cleaning; design and development of vacuum equipment and machinery systems used for controlled environment and space simulation
First Use Anywhere: Mar 13, 2008
First Use in Commerce: Mar 13, 2008

Additional Information

Design Mark
The mark consists of an uppercase letter "A" below a lowercase letter "E".
Color Claim
Color is not claimed as a feature of the mark.

Classification

International Classes
001 007 040 042