Legal Representation
Attorney
Susan M. Natland
USPTO Deadlines
Next Deadline
491 days remaining
Section 8 Declaration Due (Principal Register) (Based on registration date 20210504)
Due Date
May 04, 2027
Grace Period Ends
November 04, 2027
Additional deadlines exist. Contact your attorney for complete deadline information.
Application History
42 events| Date | Code | Type | Description | Documents |
|---|---|---|---|---|
| Nov 26, 2025 | EWAF | I | TEAS WITHDRAWAL OF ATTORNEY RECEIVED-FIRM RETAINS | Loading... |
| Nov 26, 2025 | TCCA | I | TEAS CHANGE OF CORRESPONDENCE RECEIVED | Loading... |
| Nov 26, 2025 | ECDR | I | TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS | Loading... |
| Nov 26, 2025 | ARAA | I | ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED | Loading... |
| Nov 26, 2025 | REAP | I | TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED | Loading... |
| Nov 26, 2025 | CHAN | I | APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED | Loading... |
| Nov 26, 2025 | COAR | I | TEAS CHANGE OF OWNER ADDRESS RECEIVED | Loading... |
| May 4, 2021 | R.PR | A | REGISTERED-PRINCIPAL REGISTER | Loading... |
| Apr 2, 2021 | SUNA | E | NOTICE OF ACCEPTANCE OF STATEMENT OF USE E-MAILED | Loading... |
| Apr 1, 2021 | CNPR | P | ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED | Loading... |
| Mar 30, 2021 | SUPC | I | STATEMENT OF USE PROCESSING COMPLETE | Loading... |
| Mar 9, 2021 | IUAF | S | USE AMENDMENT FILED | Loading... |
| Mar 29, 2021 | AITU | A | CASE ASSIGNED TO INTENT TO USE PARALEGAL | Loading... |
| Mar 9, 2021 | EISU | I | TEAS STATEMENT OF USE RECEIVED | Loading... |
| Sep 29, 2020 | NOAM | E | NOA E-MAILED - SOU REQUIRED FROM APPLICANT | Loading... |
| Aug 4, 2020 | NPUB | E | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED | Loading... |
| Aug 4, 2020 | PUBO | A | PUBLISHED FOR OPPOSITION | Loading... |
| Jul 15, 2020 | NONP | E | NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED | Loading... |
| Jun 27, 2020 | CNSA | P | APPROVED FOR PUB - PRINCIPAL REGISTER | Loading... |
| Jun 27, 2020 | TEME | I | TEAS/EMAIL CORRESPONDENCE ENTERED | Loading... |
| Jun 27, 2020 | CRFA | I | CORRESPONDENCE RECEIVED IN LAW OFFICE | Loading... |
| Jun 25, 2020 | ALIE | A | ASSIGNED TO LIE | Loading... |
| Jun 15, 2020 | ALIE | A | ASSIGNED TO LIE | Loading... |
| Jun 11, 2020 | ERSI | I | TEAS RESPONSE TO SUSPENSION INQUIRY RECEIVED | Loading... |
| May 19, 2020 | GNS3 | O | NOTIFICATION OF LETTER OF SUSPENSION E-MAILED | Loading... |
| May 19, 2020 | GNSL | S | LETTER OF SUSPENSION E-MAILED | Loading... |
| May 19, 2020 | CNSL | R | SUSPENSION LETTER WRITTEN | Loading... |
| May 18, 2020 | ZZZX | Z | PREVIOUS ALLOWANCE COUNT WITHDRAWN | Loading... |
| May 18, 2020 | PBMR | Z | WITHDRAWN FROM PUB - MANAGING ATTORNEY REQUEST | Loading... |
| May 12, 2020 | FIXD | O | ELECTRONIC RECORD REVIEW COMPLETE | Loading... |
| May 8, 2020 | ERRR | O | ON HOLD - ELECTRONIC RECORD REVIEW REQUIRED | Loading... |
| May 4, 2020 | ALIE | A | ASSIGNED TO LIE | Loading... |
| Apr 27, 2020 | CNSA | P | APPROVED FOR PUB - PRINCIPAL REGISTER | Loading... |
| Mar 27, 2020 | TEME | I | TEAS/EMAIL CORRESPONDENCE ENTERED | Loading... |
| Mar 26, 2020 | CRFA | I | CORRESPONDENCE RECEIVED IN LAW OFFICE | Loading... |
| Mar 26, 2020 | TROA | I | TEAS RESPONSE TO OFFICE ACTION RECEIVED | Loading... |
| Sep 27, 2019 | GNRN | O | NOTIFICATION OF NON-FINAL ACTION E-MAILED | Loading... |
| Sep 27, 2019 | GNRT | F | NON-FINAL ACTION E-MAILED | Loading... |
| Sep 27, 2019 | CNRT | R | NON-FINAL ACTION WRITTEN | Loading... |
| Sep 26, 2019 | DOCK | D | ASSIGNED TO EXAMINER | Loading... |
| Jul 17, 2019 | NWOS | I | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED | Loading... |
| Jul 15, 2019 | NWAP | I | NEW APPLICATION ENTERED | Loading... |
Detailed Classifications
Class 001
Chemical source materials for the use in deposition systems for the deposition of thin films upon semiconductor wafers, semiconductor chips, optical components, and nanotechnology components in the manufacture of semi-conductors, computer peripherals, microscopy equipment, imaging equipment, interferometer instruments, optical instruments, light emitting diode displays, monitors and screens, liquid crystal displays, monitors and screens, batteries, photovoltaic devices, with the aforementioned chemical materials being derived from metals, non-metals, ceramics, oxides, nitrides, organic compounds and polymers
First Use Anywhere:
Jun 23, 2011
First Use in Commerce:
Jun 23, 2011
Class 007
Physical and chemical vapor deposition systems, namely, coating application machines used for sputter deposition, electron beam evaporation, thermal evaporation, ion beam deposition, ion beam sputter deposition, ion assisted deposition, pulsed laser deposition, and atomic layer deposition; vacuum equipment and systems comprised of vacuum machinery and vacuum pumps used for thin film deposition, etching and cleaning; deposition system components being parts of deposition machinery, namely, substrate tables, fixturing and carriers, thermal evaporation sources, namely, deposition boats, deposition filaments and crucibles, magnetron sputter sources, electron beam evaporators, nanoparticle generators, ion generators, ion accelerators, charged particle generators for material coating and surface modification purposes, sample handling arms and robots, load lock chambers, thin film thickness measurement equipment, optical measurement equipment, process gas delivery and abatement equipment, vacuum valves, vacuum pumps and pumping systems; vacuum equipment and systems comprised of vacuum machinery and vacuum pumps for use in controlled environment and space simulation
First Use Anywhere:
Mar 13, 2008
First Use in Commerce:
Mar 13, 2008
Class 040
Manufacturing of physical and chemical vapor deposition machinery systems to the order and specification of others; manufacturing vacuum equipment and systems used for thin film deposition, etching and cleaning to the order and specification of others; manufacturing vacuum equipment and systems used for controlled environment and space simulation to the order and specification of others
First Use Anywhere:
Mar 13, 2008
First Use in Commerce:
Mar 13, 2008
Class 042
Engineering services in the field of physical and chemical vapor deposition systems; engineering services in the field of vacuum equipment and systems used for thin film deposition, etching and cleaning; mechanical and chemical engineering services; engineering services in the field of vacuum equipment and systems used for controlled environment and space simulation; design and development of physical and chemical vapor deposition machinery systems; design and development of vacuum equipment and machinery systems used for thin film deposition, etching and cleaning; design and development of vacuum equipment and machinery systems used for controlled environment and space simulation
First Use Anywhere:
Mar 13, 2008
First Use in Commerce:
Mar 13, 2008
Additional Information
Design Mark
The mark consists of an uppercase letter "A" below a lowercase letter "E".
Color Claim
Color is not claimed as a feature of the mark.
Classification
International Classes
001
007
040
042