Legal Representation
Attorney
Kenya L. Williams
USPTO Deadlines
Next Deadline
In Grace Period
Section 8 Declaration Due (Principal Register) (Based on registration date 20191022)
Due Date
October 22, 2025
Grace Period Ends
April 22, 2026
Additional deadlines exist. Contact your attorney for complete deadline information.
Application History
22 events| Date | Code | Type | Description | Documents |
|---|---|---|---|---|
| Oct 20, 2025 | E815 | I | TEAS SECTION 8 & 15 RECEIVED | Loading... |
| Oct 22, 2024 | REM1 | E | COURTESY REMINDER - SEC. 8 (6-YR) E-MAILED | Loading... |
| Mar 10, 2023 | CHAN | I | APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED | Loading... |
| Mar 10, 2023 | TCCA | I | TEAS CHANGE OF CORRESPONDENCE RECEIVED | Loading... |
| Mar 10, 2023 | ARAA | I | ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED | Loading... |
| Mar 10, 2023 | REAP | I | TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED | Loading... |
| Mar 10, 2023 | COAR | I | TEAS CHANGE OF OWNER ADDRESS RECEIVED | Loading... |
| Oct 22, 2019 | R.PR | A | REGISTERED-PRINCIPAL REGISTER | Loading... |
| Aug 6, 2019 | NPUB | E | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED | Loading... |
| Aug 6, 2019 | PUBO | A | PUBLISHED FOR OPPOSITION | Loading... |
| Jul 17, 2019 | NONP | E | NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED | Loading... |
| Jun 27, 2019 | CNSA | O | APPROVED FOR PUB - PRINCIPAL REGISTER | Loading... |
| Jun 7, 2019 | TEME | I | TEAS/EMAIL CORRESPONDENCE ENTERED | Loading... |
| Jun 7, 2019 | CRFA | I | CORRESPONDENCE RECEIVED IN LAW OFFICE | Loading... |
| Jun 7, 2019 | ALIE | A | ASSIGNED TO LIE | Loading... |
| Jun 3, 2019 | TROA | I | TEAS RESPONSE TO OFFICE ACTION RECEIVED | Loading... |
| Mar 9, 2019 | GNRN | O | NOTIFICATION OF NON-FINAL ACTION E-MAILED | Loading... |
| Mar 9, 2019 | GNRT | F | NON-FINAL ACTION E-MAILED | Loading... |
| Mar 9, 2019 | CNRT | R | NON-FINAL ACTION WRITTEN | Loading... |
| Mar 8, 2019 | DOCK | D | ASSIGNED TO EXAMINER | Loading... |
| Jan 2, 2019 | NWOS | I | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED | Loading... |
| Dec 13, 2018 | NWAP | I | NEW APPLICATION ENTERED | Loading... |
Detailed Classifications
Class 009
high brightness, submicron ion and electron beam columns using field emission technology, namely, focused ion beam columns for ion lithography, ion beam milling, secondary ion mass spectroscopy and mask repair; focused electron beam columns for electron beam lithography, electron beam microscopy, and liquid metal ion sources
First Use Anywhere:
20121200
First Use in Commerce:
20121200
Classification
International Classes
009