Legal Representation
Attorney
Kenya L. Williams
USPTO Deadlines
Next Deadline
1268 days remaining
Section 8 & 9 Renewal Due (Principal Register) (Based on registration date 20190702)
Due Date
July 02, 2029
Grace Period Ends
January 02, 2030
Application History
18 events| Date | Code | Type | Description | Documents |
|---|---|---|---|---|
| Oct 29, 2025 | NA85 | E | NOTICE OF ACCEPTANCE OF SEC. 8 & 15 - E-MAILED | Loading... |
| Oct 29, 2025 | C15A | O | REGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK. | Loading... |
| Oct 29, 2025 | APRE | A | CASE ASSIGNED TO POST REGISTRATION PARALEGAL | Loading... |
| Jul 1, 2025 | E815 | I | TEAS SECTION 8 & 15 RECEIVED | Loading... |
| Jul 2, 2024 | REM1 | E | COURTESY REMINDER - SEC. 8 (6-YR) E-MAILED | Loading... |
| Mar 10, 2023 | CHAN | I | APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED | Loading... |
| Mar 10, 2023 | TCCA | I | TEAS CHANGE OF CORRESPONDENCE RECEIVED | Loading... |
| Mar 10, 2023 | ARAA | I | ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED | Loading... |
| Mar 10, 2023 | REAP | I | TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED | Loading... |
| Mar 10, 2023 | COAR | I | TEAS CHANGE OF OWNER ADDRESS RECEIVED | Loading... |
| Jul 2, 2019 | R.PR | A | REGISTERED-PRINCIPAL REGISTER | Loading... |
| Apr 16, 2019 | NPUB | E | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED | Loading... |
| Apr 16, 2019 | PUBO | A | PUBLISHED FOR OPPOSITION | Loading... |
| Mar 27, 2019 | NONP | E | NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED | Loading... |
| Mar 9, 2019 | CNSA | O | APPROVED FOR PUB - PRINCIPAL REGISTER | Loading... |
| Mar 8, 2019 | DOCK | D | ASSIGNED TO EXAMINER | Loading... |
| Jan 2, 2019 | NWOS | I | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED | Loading... |
| Dec 13, 2018 | NWAP | I | NEW APPLICATION ENTERED | Loading... |
Detailed Classifications
Class 009
high brightness, submicron ion and electron beam columns using field emission technology, namely, focused ion beam columns for ion lithography, ion beam milling, secondary ion mass spectroscopy and mask repair; focused electron beam columns for electron beam lithography, electron beam microscopy, and liquid metal ion sources
First Use Anywhere:
20131200
First Use in Commerce:
20131200
Classification
International Classes
009