Legal Representation
Attorney
Susan M. Natland
USPTO Deadlines
Next Deadline
43 days remaining
Section 8 Declaration Due (Principal Register) (Based on registration date 20200211)
Due Date
February 11, 2026
Grace Period Ends
August 11, 2026
Additional deadlines exist. Contact your attorney for complete deadline information.
Application History
41 events| Date | Code | Type | Description | Documents |
|---|---|---|---|---|
| Nov 26, 2025 | EWAF | I | TEAS WITHDRAWAL OF ATTORNEY RECEIVED-FIRM RETAINS | Loading... |
| Nov 26, 2025 | TCCA | I | TEAS CHANGE OF CORRESPONDENCE RECEIVED | Loading... |
| Nov 26, 2025 | ECDR | I | TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS | Loading... |
| Nov 26, 2025 | ARAA | I | ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED | Loading... |
| Nov 26, 2025 | REAP | I | TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED | Loading... |
| Nov 26, 2025 | CHAN | I | APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED | Loading... |
| Nov 26, 2025 | COAR | I | TEAS CHANGE OF OWNER ADDRESS RECEIVED | Loading... |
| Feb 11, 2025 | REM1 | E | COURTESY REMINDER - SEC. 8 (6-YR) E-MAILED | Loading... |
| Feb 11, 2020 | R.PR | A | REGISTERED-PRINCIPAL REGISTER | Loading... |
| Nov 26, 2019 | NPUB | E | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED | Loading... |
| Nov 26, 2019 | PUBO | A | PUBLISHED FOR OPPOSITION | Loading... |
| Nov 6, 2019 | NONP | E | NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED | Loading... |
| Oct 22, 2019 | PREV | O | LAW OFFICE PUBLICATION REVIEW COMPLETED | Loading... |
| Oct 21, 2019 | CNSA | O | APPROVED FOR PUB - PRINCIPAL REGISTER | Loading... |
| Oct 15, 2019 | XAEC | I | EXAMINER'S AMENDMENT ENTERED | Loading... |
| Oct 12, 2019 | GNEN | O | NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED | Loading... |
| Oct 12, 2019 | GNEA | O | EXAMINERS AMENDMENT E-MAILED | Loading... |
| Oct 12, 2019 | CNEA | R | EXAMINERS AMENDMENT -WRITTEN | Loading... |
| Sep 25, 2019 | TEME | I | TEAS/EMAIL CORRESPONDENCE ENTERED | Loading... |
| Sep 25, 2019 | CRFA | I | CORRESPONDENCE RECEIVED IN LAW OFFICE | Loading... |
| Sep 19, 2019 | ALIE | A | ASSIGNED TO LIE | Loading... |
| Sep 11, 2019 | ERSI | I | TEAS RESPONSE TO SUSPENSION INQUIRY RECEIVED | Loading... |
| Apr 22, 2019 | GNS2 | O | NOTIFICATION OF INQUIRY AS TO SUSPENSION E-MAILED | Loading... |
| Apr 22, 2019 | GNSI | S | INQUIRY TO SUSPENSION E-MAILED | Loading... |
| Apr 22, 2019 | CNSI | R | SUSPENSION INQUIRY WRITTEN | Loading... |
| Apr 19, 2019 | RCCK | S | SUSPENSION CHECKED - TO ATTORNEY FOR ACTION | Loading... |
| Apr 4, 2019 | ALIE | A | ASSIGNED TO LIE | Loading... |
| Sep 19, 2018 | GNS3 | O | NOTIFICATION OF LETTER OF SUSPENSION E-MAILED | Loading... |
| Sep 19, 2018 | GNSL | S | LETTER OF SUSPENSION E-MAILED | Loading... |
| Sep 19, 2018 | CNSL | R | SUSPENSION LETTER WRITTEN | Loading... |
| Aug 1, 2018 | TEME | I | TEAS/EMAIL CORRESPONDENCE ENTERED | Loading... |
| Jul 31, 2018 | CRFA | I | CORRESPONDENCE RECEIVED IN LAW OFFICE | Loading... |
| Jul 31, 2018 | TROA | I | TEAS RESPONSE TO OFFICE ACTION RECEIVED | Loading... |
| Feb 1, 2018 | GNRN | O | NOTIFICATION OF NON-FINAL ACTION E-MAILED | Loading... |
| Feb 1, 2018 | GNRT | F | NON-FINAL ACTION E-MAILED | Loading... |
| Feb 1, 2018 | CNRT | R | NON-FINAL ACTION WRITTEN | Loading... |
| Feb 1, 2018 | AMPX | O | PRELIMINARY/VOLUNTARY AMENDMENT - ENTERED | Loading... |
| Jan 25, 2018 | PARI | I | TEAS VOLUNTARY AMENDMENT RECEIVED | Loading... |
| Jan 13, 2018 | DOCK | D | ASSIGNED TO EXAMINER | Loading... |
| Oct 12, 2017 | NWOS | I | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED | Loading... |
| Oct 9, 2017 | NWAP | I | NEW APPLICATION ENTERED | Loading... |
Detailed Classifications
Class 001
Physical and chemical vapor deposition machines for sputter deposition, electron beam evaporation, thermal evaporation, ion beam deposition, ion beam sputter deposition, ion assisted deposition, pulsed laser deposition, atomic layer deposition; materials, namely, metals, non-metals, ceramics, oxides, nitrides, organic compounds and polymers, used in deposition systems for the purpose of creating thin films for applications in semiconductors, optics and nanotechnology
Class 007
Vacuum equipment and systems comprised of vacuum machinery and vacuum pumps for used for thin film deposition, etching and cleaning; deposition system components being parts of deposition machinery, namely, deposition system components, namely, substrate tables, fixturing and carriers, thermal evaporation sources, namely, deposition boats, deposition filaments and crucibles, magnetron sputter sources, electron beam evaporators, nanoparticle generators, ion generators, ion accelerators, charged particle generators for material coating and surface modification purposes, sample handling arms and robots, load lock chambers, thin film thickness measurement equipment, optical measurement equipment, process gas delivery and abatement equipment, vacuum valves, vacuum pumps and pumping systems; vacuum equipment and systems comprised of vacuum machinery and vacuum pumps for use in controlled environment and space simulation
Class 040
Custom designing, developing and manufacturing of physical and chemical vapor deposition systems for others; custom designing, developing and manufacturing of vacuum equipment and systems used for thin film deposition, etching and cleaning for others; custom designing, developing and manufacturing vacuum equipment and systems used for controlled environment and space simulation for others
Class 042
Engineering services in the field of physical and chemical vapor deposition systems; engineering services in the field of vacuum equipment and systems used for thin film deposition, etching and cleaning; mechanical and chemical engineering services; engineering services in the field of vacuum equipment and systems used for controlled environment and space simulation
Classification
International Classes
001
007
040
042
Disclaimers
The following terms have been disclaimed and are not claimed as part of the trademark:
Specific Disclaimer
"ENGINEERING"