USPTO Deadlines
Next Deadline
1972 days remaining
Section 8 & 9 (20-Year) Renewal Due (Based on registration date 2010-12-28)
Due Date
December 28, 2030
Grace Period Ends
June 28, 2031
Application History
26 events| Date | Code | Type | Description | Documents |
|---|---|---|---|---|
| Apr 30, 2025 | ASGN | I | AUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP | Loading... |
| Apr 30, 2021 | NA89 | E | NOTICE OF ACCEPTANCE OF SEC. 8 & 9 - E-MAILED | Loading... |
| Apr 30, 2021 | RNL1 | Q | REGISTERED AND RENEWED (FIRST RENEWAL - 10 YRS) | Loading... |
| Apr 30, 2021 | 89AG | O | REGISTERED - SEC. 8 (10-YR) ACCEPTED/SEC. 9 GRANTED | Loading... |
| Apr 30, 2021 | APRE | A | CASE ASSIGNED TO POST REGISTRATION PARALEGAL | Loading... |
| Jan 19, 2021 | E89R | I | TEAS SECTION 8 & 9 RECEIVED | Loading... |
| Dec 28, 2019 | REM2 | E | COURTESY REMINDER - SEC. 8 (10-YR)/SEC. 9 E-MAILED | Loading... |
| Jul 3, 2019 | ASGN | I | AUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP | Loading... |
| Feb 16, 2017 | NA85 | E | NOTICE OF ACCEPTANCE OF SEC. 8 & 15 - E-MAILED | Loading... |
| Feb 16, 2017 | C15A | O | REGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK. | Loading... |
| Feb 16, 2017 | APRE | A | CASE ASSIGNED TO POST REGISTRATION PARALEGAL | Loading... |
| Dec 9, 2016 | TCCA | I | TEAS CHANGE OF CORRESPONDENCE RECEIVED | Loading... |
| Dec 9, 2016 | E815 | I | TEAS SECTION 8 & 15 RECEIVED | Loading... |
| Dec 28, 2010 | R.PR | A | REGISTERED-PRINCIPAL REGISTER | Loading... |
| Oct 12, 2010 | PUBO | A | PUBLISHED FOR OPPOSITION | Loading... |
| Oct 12, 2010 | NPUB | E | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED | Loading... |
| Sep 4, 2010 | PREV | O | LAW OFFICE PUBLICATION REVIEW COMPLETED | Loading... |
| Sep 4, 2010 | ALIE | A | ASSIGNED TO LIE | Loading... |
| Aug 23, 2010 | CNSA | O | APPROVED FOR PUB - PRINCIPAL REGISTER | Loading... |
| Aug 23, 2010 | GNEN | O | NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED | Loading... |
| Aug 23, 2010 | GNEA | F | EXAMINERS AMENDMENT E-MAILED | Loading... |
| Aug 23, 2010 | CNEA | R | EXAMINERS AMENDMENT -WRITTEN | Loading... |
| Aug 23, 2010 | XAEC | I | EXAMINER'S AMENDMENT ENTERED | Loading... |
| Aug 18, 2010 | DOCK | D | ASSIGNED TO EXAMINER | Loading... |
| Jun 24, 2010 | NWAP | I | NEW APPLICATION ENTERED | Loading... |
| Jun 24, 2010 | NWOS | I | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED | Loading... |
Detailed Classifications
Class 001
Chemicals used in the manufacture of goods in the semiconductor, photovoltaic and LED industries, namely, metal or metal oxide photoresist chemical remover, post etch remover, post etch cleaner, post etch treatments, and photoresist remover for the semiconductor, photovoltaic and LED industries
First Use Anywhere:
Jun 1, 1973
First Use in Commerce:
Jun 1, 1973
Classification
International Classes
001