USPTO Deadlines
Application History
15 events| Date | Code | Type | Description | Documents |
|---|---|---|---|---|
| May 9, 2025 | OPNX | P | NOTIFICATION OF POSSIBLE OPPOSITION - PROCESSED BY IB | Loading... |
| Apr 22, 2025 | OPNS | P | NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB | Loading... |
| Apr 22, 2025 | OPNR | P | NOTIFICATION OF POSSIBLE OPPOSITION CREATED, TO BE SENT TO IB | Loading... |
| Oct 24, 2024 | MAB2 | O | ABANDONMENT NOTICE MAILED - FAILURE TO RESPOND | Loading... |
| Oct 24, 2024 | ABN2 | O | ABANDONMENT - FAILURE TO RESPOND OR LATE RESPONSE | Loading... |
| Apr 8, 2024 | RFNT | P | REFUSAL PROCESSED BY IB | Loading... |
| Mar 19, 2024 | RFCS | P | NON-FINAL ACTION MAILED - REFUSAL SENT TO IB | Loading... |
| Mar 19, 2024 | RFRR | P | REFUSAL PROCESSED BY MPU | Loading... |
| Feb 27, 2024 | RFCR | E | NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW | Loading... |
| Feb 26, 2024 | CNRT | R | NON-FINAL ACTION WRITTEN | Loading... |
| Feb 14, 2024 | DOCK | D | ASSIGNED TO EXAMINER | Loading... |
| Dec 5, 2023 | MAFR | O | APPLICATION FILING RECEIPT MAILED | Loading... |
| Dec 1, 2023 | NWOS | I | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED | Loading... |
| Nov 27, 2023 | LIMI | I | LIMITATION FROM ORIGINAL APPLICATION ENTERED | Loading... |
| Nov 23, 2023 | REPR | M | SN ASSIGNED FOR SECT 66A APPL FROM IB | Loading... |
Detailed Classifications
Class 001
Hydrophilic chemical agents for industrial purposes; detergents for industrial use; chemicals; chemically reactive solutions for use with abrasives for semiconductors; chemically reactive solutions for use with abrasives for electronic substrates; auxiliary fluids for use with abrasives
Class 003
Abrasive paper (sand paper); abrasive cloth; abrasive sand; polishing paper; polishing preparations; semiconductor polishing slurries; electronic substrate polishing slurries; polishing slurries; abrasive preparations; pads impregnated with polishing preparations; impregnated cloths for polishing; grinding preparations; sharpening preparations; abrasives; scouring solutions; metal polishes; hydrophilic agents for industrial polishing; chemical slurries for polishing semiconductors; chemical slurries for polishing electronic substrates
Class 007
Work holding instruments for semiconductor wafer polishing machines and apparatus; templates for semiconductor wafer polishing machines and apparatus; blank templates for semiconductor wafer polishing machines and apparatus; mounting pads and sheets for semiconductor wafer polishing machines and apparatus; polishing pads for semiconductor wafer polishing machines and apparatus; conditioners used for polishing pads for semiconductor wafer polishing machines and apparatus; semiconductor wafer polishing machines and apparatus; parts and accessories of semiconductor wafer polishing machines and apparatus; semiconductor manufacturing machines and apparatus; work holding instruments for glass polishing machines and apparatus; templates for glass polishing machines and apparatus; blank templates for glass polishing machines and apparatus; mounting pads and sheets for glass polishing machines and apparatus; polishing pads for glass polishing machines and apparatus; conditioners used for polishing pads for glass polishing machines and apparatus; glass polishing machines and apparatus; parts and accessories of glass polishing machines and apparatus; work holding instruments for glass substrate polishing machines and apparatus; templates for glass substrate polishing machines and apparatus; blank templates for glass substrate polishing machines and apparatus; mounting pads and sheets for glass substrate polishing machines and apparatus; polishing pads for glass substrate polishing machines and apparatus; conditioners used for polishing pads for glass substrate polishing machines and apparatus; glass substrate polishing machines and apparatus; parts and accessories of glass substrate polishing machines and apparatus; work holding instruments for polishing machines and apparatus for manufacturing hard disks; templates for polishing machines and apparatus for manufacturing hard disks; blank templates for polishing machines and apparatus for manufacturing hard disks; mounting pads and sheets for polishing machines and apparatus for manufacturing hard disks; polishing pads for polishing machines and apparatus for manufacturing hard disks; conditioners used for polishing pads for polishing machines and apparatus for manufacturing hard disks; polishing machines and apparatus for manufacturing hard disks; parts and accessories of polishing machines and apparatus for manufacturing hard disks; work holding instruments for electric polishing machines and apparatus; templates for electric polishing machines and apparatus; blank templates for electric polishing machines and apparatus; mounting pads and sheets for electric polishing machines and apparatus; polishing pads for electric polishing machines and apparatus; conditioners used for polishing pads for electric polishing machines and apparatus; electric polishing machines and apparatus; parts and accessories of electric polishing machines and apparatus; polishing pads for electric polishing machines; polishing cloths used as parts or accessories of electric polishing machines
Additional Information
Color Claim
The color(s) blue, red, black is/are claimed as a feature of the mark.
Classification
International Classes
001
003
007