THE GAS PROFESSIONALS

Serial Number 79363755
Registration 7725997
700

Registration Progress

Application Filed
Dec 23, 2022
Under Examination
Approved for Publication
Jan 28, 2025
Published for Opposition
Jan 28, 2025
Registered
Mar 18, 2025

Trademark Image

THE GAS PROFESSIONALS

Basic Information

Serial Number
79363755
Registration Number
7725997
Filing Date
December 23, 2022
Registration Date
March 18, 2025
Published for Opposition
January 28, 2025
Drawing Code
5

Status Summary

Current Status
Active
Status Code
700
Status Date
Mar 18, 2025
Registration
Registered
Classes
001

Rights Holder

NIPPON SANSO HOLDINGS CORPORATION

03
Address
3-26, Koyama 1-chome,
Shinagawa-ku Tokyo 142-8558
JP

Ownership History

NIPPON SANSO HOLDINGS CORPORATION

Original Applicant
03
JP

NIPPON SANSO HOLDINGS CORPORATION

Owner at Publication
03
JP

NIPPON SANSO HOLDINGS CORPORATION

Original Registrant
03
JP

Legal Representation

Attorney
Tomoko Nakajima

USPTO Deadlines

Next Deadline
2057 days remaining
Section 8 (6-Year) Declaration Due (Based on registration date 2025-03-18)
Due Date
March 18, 2031
Grace Period Ends
September 18, 2031
Additional deadlines exist. Contact your attorney for complete deadline information.

Application History

28 events
Date Code Type Description Documents
Jun 18, 2025 FICR P FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB Loading...
Mar 18, 2025 NRCC E NOTICE OF REGISTRATION CONFIRMATION EMAILED Loading...
Mar 18, 2025 R.PR A REGISTERED-PRINCIPAL REGISTER Loading...
Jan 28, 2025 NPUB E OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED Loading...
Jan 28, 2025 PUBO A PUBLISHED FOR OPPOSITION Loading...
Jan 22, 2025 NONP E NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED Loading...
Oct 28, 2024 CNSA O APPROVED FOR PUB - PRINCIPAL REGISTER Loading...
Oct 3, 2024 TEME I TEAS/EMAIL CORRESPONDENCE ENTERED Loading...
Oct 3, 2024 ERFR I TEAS REQUEST FOR RECONSIDERATION RECEIVED Loading...
Oct 3, 2024 CRFA I CORRESPONDENCE RECEIVED IN LAW OFFICE Loading...
Aug 11, 2024 OPNX P NOTIFICATION OF POSSIBLE OPPOSITION - PROCESSED BY IB Loading...
Jul 22, 2024 OPNS P NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB Loading...
Jul 21, 2024 OPNR P NOTIFICATION OF POSSIBLE OPPOSITION CREATED, TO BE SENT TO IB Loading...
Jun 6, 2024 GNFN O NOTIFICATION OF FINAL REFUSAL EMAILED Loading...
Jun 6, 2024 GNFR O FINAL REFUSAL E-MAILED Loading...
Jun 6, 2024 CNFR R FINAL REFUSAL WRITTEN Loading...
Apr 22, 2024 TROA I TEAS RESPONSE TO OFFICE ACTION RECEIVED Loading...
Apr 22, 2024 TEME I TEAS/EMAIL CORRESPONDENCE ENTERED Loading...
Apr 22, 2024 CRFA I CORRESPONDENCE RECEIVED IN LAW OFFICE Loading...
Nov 13, 2023 RFNT P REFUSAL PROCESSED BY IB Loading...
Oct 24, 2023 RFCS P NON-FINAL ACTION MAILED - REFUSAL SENT TO IB Loading...
Oct 24, 2023 RFRR P REFUSAL PROCESSED BY MPU Loading...
Oct 12, 2023 RFCR E NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW Loading...
Oct 11, 2023 CNRT R NON-FINAL ACTION WRITTEN Loading...
Sep 24, 2023 DOCK D ASSIGNED TO EXAMINER Loading...
Mar 3, 2023 MAFR O APPLICATION FILING RECEIPT MAILED Loading...
Feb 27, 2023 NWOS I NEW APPLICATION OFFICE SUPPLIED DATA ENTERED Loading...
Feb 24, 2023 REPR M SN ASSIGNED FOR SECT 66A APPL FROM IB Loading...

Detailed Classifications

Class 001
Industrial chemicals; gases for industrial use, namely, gases, not being fuels, for general industrial use, namely, 1,1,1,2-tetrafluoroethane, 1,1,1-trichloro-2,2,2-trifluoroethane, 1,1,1trichloroethane, 1,1,2,2-tetrachloroethane, 1,1,2-trichloro-1,2,2-trifluoroethane, 1,1,2trichloroethane,1,1- dichloroethylene, 1,1-difluoroethane, 1,2-dichlorotetrafluoroethane, 1,3-butadiene, 1-butene, 1-chloro-2-propanol, 1-chloropropane, 1-hexene, 1-octene, 1-pentene, 2,2,4trimethylpentane, 2,3-dimethylbutane, 2,4-dimethylpentane, 2,5-dimethylthiophene, 2-ethylbutene-1, 2hexene, 2-methylbutyraldehyde, 2-methyl-1-butene, 2-methyl-2-butene, 2-methylbutane, 2methylhexane, 2-methylpentane, 2-methylthiophene, 2-pentene, 2-propanol, 3,3-dimethyl-1-butene, 3methyl 1-butene, 3-methylpentane, 4-methyl-1-pentene, 4-vinylcyclohexene, carbon monoxide, carbon dioxide and nitrogen, ethanol in air, acetaldehyde, acetone, acetonitrile, acetylacetone, acetylene, acrolein, acrylonitrile, compressed liquid air, allene, ammonia, antimony pentafluoride, argon, argon and carbon dioxide mixture, argon and helium mixture, argon and oxygen mixture, arsenic fluoride, arsenic pentafluoride, arsine, methyl benzene, benzoic acid, benzyl-D7 chloride, bis trimethylsilyl acetamide, 2-methoxyethyl adipate, boron trichloride, boron trifluoride, bromine pentafluoride, bromine trifluoride, bromochlorodifluoromethane, bromotrifluoroethylene, butadiene, butyl benzene, butyl mercaptan, butyl nitrate, carbon dioxide, carbon dioxide in argon and helium mixture, carbon disulfide, carbon monoxide, carbon monoxide in air, carbon monoxide in nitrogen, carbon tetrachloride, carbonyl fluoride, carbonyl sulfide, chlorine, chlorine trifluoride, chlorobenzene, chlorodifluoromethane, chloroiodomethane, chloropentafluoroethane, chlorotrifluoromethane, cinnamaldehyde, cis-1,2-dichloroethylene, cis-2-butene, cis-2-pentene, cumene, cyanogen, cyanogen chloride, cyclohexane, cyclohexanone, cyclopentane, cyclopropane, deuterium, diborane, dibromomethane, dibutyl ether, dichlorodifluoromethane, dichloromethane, dichloromonofluoromethane, dichlorosilane, dichlorotetrafluoroethane, diethyl disufide, diethyl telluride, difluorodibromomethane, difluoromonochloroethane, digermane, dimethyl ether, dimethyl sulfate, dimethyl sulfide, dimethyl sulfoxide, dimethylamine, dimethyl zinc, dipropyl ether, disilane, dodecane, 2-chloro-1-difluoromethoxy-l, 1,2-trifluoroethane, ethane, ethanol, ethyl acetate, ethyl acetylene, ethyl acrylate, ethyl alcohol, ethyl benzene, ethyl chloride, ethyl cyclohexane, ethyl ether, ethyl formate, ethyl mercaptan, ethyl methyl sulfide, ethyl sulfide, ethylamine, ethylene, ethylene dichloride, ethylene glycol, ethylene glycol dimethyl ether, ethylene glycol monomethyl ether, ethylene oxide and nitrogen, ethylene oxide, fluorine, trifluoromethane, fluorotrichloromethane, 2-chloro-2difluoromethoxy-1, 1, 1-trifluoroethane, formaldehyde gas, furan, furfuryl alcohol, germanium tetrachloride, germanium tetrahydride, trichlorofluoromethane, chlorotrifluoroethylene, trichlorotrifluoroethane, 1,2-dichloro 1,1,2,2-tetrafluoroethane, hexafluoroethane, dichlorodifluoromethane, chlorotrifluoromethane, 1,1,1, 2-tetrafluoroethane, bromotrifluoromethane, carbon tetrafluoride, monochlorodifluoromethane, trifluoromethane, octafluorocyclobutane, 1,1,1 trifluoro-2-chloro-2-bromoethane, helium, heptane, hexafluoroethane, hexafluoropropene, hexafluorpropylene, hydriodic acid, hydrogen, hydrogen bromide, hydrogen chloride, hydrogen cyanide, hydrogen fluoride, hydrogen selenide, hydrogen sulfide, hydrogen iodide, iodine pentafluoride, isobutane, isobutene, isobutyl alcohol, isobutyl nitrate, isobutylene, isohexene, isopentane, isoprene, isopropyl alcohol, isopropyl chloride, isopropyl ether, isopropyl mercaptan, krypton, methane, methane in argon, helium and nitrogen air mixture, methane, methane and hydrogen gas mixture, methanol, methoxyflurane, methyl acetate, methyl acetylene, methyl acrylate, methyl alcohol, methyl bromide, methyl chloride, methyl disulfide, methyl ethyl ketone, methyl fluoride, methyl formate, methyl iodide, methyl isobutyl ketone, methyl mercaptan, methyl methacrylate, methyl propionate, methyl salicylate, methyl tert-butyl ether, methyl vinyl ketone, dimethoxymethane, methylamine, methylcyclopentane, methylene bromide, methylene fluoride, monomethylamine, m-xylene, n-amylamine, naphthalene, n-butane, n-butyl acetate, n-butyl alcohol, nbutyl sulfide, n-butyraldehyde, n-decane, neohexane, neon, neopentane, n-heptane, n-hexane, nickel carbonyl, nitrogen, nitric oxide, nitric oxide and nitrogen mixture, nitric oxide and sulfur dioxide and nitrogen gas mixture, nitrogen dioxide, nitrogen trifluoride, nitrosyl chloride, nitrous oxide, n-octane, nonane, n-pentane, n-propyl acetate, n-propyl alcohol, octafluorocyclobutanem, octafluorocyclopentene, octane, o-dichlorobenzene, oxides of nitrogen in nitrogen, oxygen in nitrogen, oxygen, oxygen and nitrogen gas mixture, o-xylene, pentane, perfluoro-2-butene, perfluoropropane, permanganate and alkali impregnated diatomaceous earth, phosgene, phosphine, phosphorus pentafluoride, phosphorus trifluoride, piperidine, Propane being propellant gases for aerosols, propane in air being gas propellants for aerosols, propane in nitrogen being nitrogen compounds containing minor amounts of propane, propionaldehyde, propyl mercaptan, propylene, propylene oxide, p-xylene, pyridine, arsenic fluoride, arsine, boron trifluoride, germanium tetrafluoride, silicon tetrafluoride, sec-butyl alcohol, silane, silicon tetrachloride, sodium dichromate, sodium metal, styrene, styrene monomer, sulfur dioxide, sulfur dioxide in air, sulfur dioxide in nitrogen, sulfur dioxide and nitrogen mixture, sulfur hexafluoride, sulfur tetrafluoride, sulfuryl fluoride, tert-butyl chloride, tert-butyl mercaptan, tetrachloroethylene, tetraethylene glycol dimethyl ether, tetraethylorthosilicate, tetrafluoroethylene, tetrafluoromethane, tetrahydrofuran, tetrahydronaphithalene, thiophene, titanium tetrachloride, toluene, trans-l,2-dichloroethylene, trans-2-butene, trans-2-pentene, trans-3-hexene, trans3-hexene, transition metal salt impregnated diatomaceous earth, trichloroethylene, trichlorosilane, triethyl phosphite, triethylene glycol, trifluorochloroethylene, trifluoromonobromomethane, trimethyl phosphite, trimethylamine, tungsten hexafluoride, undecane, valeraldehyde, vinyl acetate, vinyl bromide, vinyl chloride, vinyl fluoride, vinyl methyl ether, vinylidene chloride, vinylidene fluoride, xenon, zinc arsenide; stable isotope labeled chemical compounds for industrial use and research use; biochemical products used for scientific research, namely, cell culture media used in microbiology and tissue cultures; reagents for research purposes; gases for welding

Classification

International Classes
001