TOKUYAMA

Serial Number 79036420
Registration 3449668
706

Registration Progress

Application Filed
Nov 8, 2006
Under Examination
Approved for Publication
Mar 12, 2008
Published for Opposition
Apr 1, 2008
Registered
Jun 17, 2008

Trademark Image

TOKUYAMA

Basic Information

Serial Number
79036420
Registration Number
3449668
Filing Date
November 8, 2006
Registration Date
June 17, 2008
Published for Opposition
April 1, 2008
Drawing Code
5000

Status Summary

Current Status
Active
Status Code
706
Status Date
Mar 29, 2018
Registration
Registered
Classes
001

Rights Holder

TOKUYAMA CORPORATION

99
Address
1-1, Mikage-cho, Shunan-shi
Yamaguchi 745-8648
JP

Ownership History

TOKUYAMA CORPORATION

Original Applicant
99
JP

TOKUYAMA CORPORATION

Owner at Publication
99
JP

TOKUYAMA CORPORATION

Original Registrant
99
JP

Legal Representation

Attorney
Andrew Roppel

USPTO Deadlines

Next Deadline
898 days remaining
Section 71 Renewal Due (Principal Register 66a) (Based on registration date 20080617)
Due Date
June 17, 2028
Grace Period Ends
December 17, 2028

Application History

45 events
Date Code Type Description Documents
Jan 25, 2019 INNP P PARTIAL INVALIDATION PROCESSED BY THE IB Loading...
Dec 7, 2018 INPS P PARTIAL INVALIDATION OF REG EXT PROTECTION SENT TO IB Loading...
Dec 7, 2018 INPC P INVALIDATION PROCESSED Loading...
Nov 29, 2018 INPR P PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED Loading...
Mar 29, 2018 NA71 E NOTICE OF ACCEPTANCE OF SEC. 71 - E-MAILED Loading...
Mar 29, 2018 71AG O REGISTERED-SEC.71 ACCEPTED Loading...
Mar 26, 2018 ES71 I TEAS SECTION 71 RECEIVED Loading...
Jun 17, 2017 REM4 E COURTESY REMINDER - SEC. 71 (10-YR) E-MAILED Loading...
Dec 1, 2016 RNWL P INTERNATIONAL REGISTRATION RENEWED Loading...
Mar 25, 2014 NA75 E NOTICE OF ACCEPTANCE OF SEC. 71 & 15 - E-MAILED Loading...
Mar 25, 2014 C75A O REGISTERED - SEC. 71 ACCEPTED & SEC. 15 ACK. Loading...
Feb 27, 2014 715F I REGISTERED - SEC. 71 & SEC. 15 FILED Loading...
Mar 25, 2014 APRE A CASE ASSIGNED TO POST REGISTRATION PARALEGAL Loading...
Feb 27, 2014 ES75 I TEAS SECTION 71 & 15 RECEIVED Loading...
Dec 30, 2012 FINO P FINAL DECISION TRANSACTION PROCESSED BY IB Loading...
Apr 12, 2012 ADCH M CHANGE OF NAME/ADDRESS REC'D FROM IB Loading...
Oct 3, 2008 FICS P FINAL DISPOSITION NOTICE SENT TO IB Loading...
Oct 3, 2008 FIMP P FINAL DISPOSITION PROCESSED Loading...
Sep 17, 2008 FICR P FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB Loading...
Jun 17, 2008 R.PR A REGISTERED-PRINCIPAL REGISTER Loading...
Apr 1, 2008 PUBO A PUBLISHED FOR OPPOSITION Loading...
Mar 12, 2008 NPUB O NOTICE OF PUBLICATION Loading...
Feb 27, 2008 PREV O LAW OFFICE PUBLICATION REVIEW COMPLETED Loading...
Jan 29, 2008 ALIE A ASSIGNED TO LIE Loading...
Dec 17, 2007 CNSA O APPROVED FOR PUB - PRINCIPAL REGISTER Loading...
Dec 13, 2007 TEME I TEAS/EMAIL CORRESPONDENCE ENTERED Loading...
Dec 13, 2007 CRFA I CORRESPONDENCE RECEIVED IN LAW OFFICE Loading...
Dec 13, 2007 TROA I TEAS RESPONSE TO OFFICE ACTION RECEIVED Loading...
Oct 24, 2007 GNRN O NOTIFICATION OF NON-FINAL ACTION E-MAILED Loading...
Oct 24, 2007 GNRT O NON-FINAL ACTION E-MAILED Loading...
Oct 24, 2007 CNRT R NON-FINAL ACTION WRITTEN Loading...
Sep 24, 2007 TEME I TEAS/EMAIL CORRESPONDENCE ENTERED Loading...
Sep 24, 2007 CRFA I CORRESPONDENCE RECEIVED IN LAW OFFICE Loading...
Sep 24, 2007 TROA I TEAS RESPONSE TO OFFICE ACTION RECEIVED Loading...
Sep 21, 2007 ARAA I ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED Loading...
Sep 21, 2007 REAP I TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED Loading...
Jun 8, 2007 RFNT P REFUSAL PROCESSED BY IB Loading...
May 21, 2007 RFCS P NON-FINAL ACTION MAILED - REFUSAL SENT TO IB Loading...
May 21, 2007 RFRR P REFUSAL PROCESSED BY MPU Loading...
May 19, 2007 RFCR E NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW Loading...
May 18, 2007 CNRT R NON-FINAL ACTION WRITTEN Loading...
May 7, 2007 LIMS I LIMITATION OF GOODS/SERVICES FROM IB ENTERED Loading...
May 4, 2007 DOCK D ASSIGNED TO EXAMINER Loading...
May 4, 2007 NWAP I NEW APPLICATION ENTERED Loading...
May 3, 2007 REPR M SN ASSIGNED FOR SECT 66A APPL FROM IB Loading...

Detailed Classifications

Class 001
[ Chemicals for use in industry, namely, alkalies, bases being chemical preparations for use in industry, acids used in industry, namely, hydrochloric acid, sulfuric acid, nitric acid, hydrofluoric acid, silicic acid, carbonic acid, acetic acid, salts for industrial purposes, namely, halides and halogen acid salts, calcium chloride, carbonates, sodium carbonate, sodium bicarbonate, sulphates, nitrates, acetates, organic halogenides, silicate, calcium silicate, sodium silicate, magnesium salts, magnesium carbonate, oxides, anhydrides being chemical preparations for use in industry, simple substances for industrial purposes, namely, chlorine, boron, salts of alkaline metals, chlorides, namely, calcium chloride, sodium chlorite, sodium hypochlorite, sodium chlorate, carbonates, calcium salts, silicates for industrial purposes, namely, calcium silicate, sodium silicate, alcohols for industrial purposes, namely, methyl alcohol, ethyl alcohol, isopropyl alcohol, organic halogenides, caustic sodas for industrial purposes, soda ashes, calcium chlorides, magnesium chlorides, calcium silicates and ] silicas, [ sodium silicates for industrial purposes, ] silicon dioxides for industrial purposes, aluminum nitrides for industrial purposes, [ ammonias for industrial purposes, sulphuric acids, ion-exchange resins being chemical preparations, ion-exchange resin membranes being chemical preparations, ion-exchangers being chemical preparations, household-use moisture absorbents, namely, chemical compositions for solidification of fluids and for absorbing spills being deliquescent salts such as calcium chloride stored therein for use in closed storehouses and closets, surface-active agents, namely, surface active compounds for general use in the industrial arts, namely, as wetting, spreading, emulsifying, dispersing and penetrating agents, catalysts for use in the manufacture of industrial chemicals, water-purifying chemicals used for drinking water, chemical substances for preserving foodstuffs, protecting groups for amino groups being chemicals for use in manufacturing pharmaceutical preparations, namely, Di-Tertiary-Butyl-Dicarbonate, protecting groups for amino groups being chemicals for use in manufacturing veterinary and sanitary preparations, namely, Di-Tertiary-Butyl-Dicarbonate, protecting groups for amino groups being chemicals for use in manufacturing disinfectants, namely, Di-Tertiary-Butyl-Dicarbonate, protecting groups for amino groups being chemicals for use in manufacturing preparations for destroying vermin, namely, Di-Tertiary-Butyl-Dicarbonate, protecting groups for amino groups being chemicals for use in manufacturing fungicides and herbicides, namely, Di-Tertiary-Butyl-Dicarbonate, propylenes for industrial purposes, chemicals consisting primarily of acrylates monomer and methacrylates monomer for use in manufacturing plastic lens, photochromic chemical compounds for use in manufacturing plastic lens, chemical preparations used in plastics coating, chemical reagents other than for medical purposes, condensing agent other than for medical and veterinary purposes, namely, condensing agent for use in the manufacture of pharmaceutical products and agricultural chemicals and intermediates, diagnostic preparations other than for medical or veterinary purposes, anti-freezing and de-icing preparations, soil stabilizing agents, namely, soil stabilizing agents comprising cement, soil stabilizing agents comprising lime, soil stabilizing agents comprising silicates, halides and halogen acid salts; unprocessed plastics for industrial purposes; polypropylene resins for industrial purposes; polyvinylchloride resins for industrial purposes; plant growth regulating preparations; fertilizers; ] polycrystalline silicons for industrial purposes; [ chemical preparations for cleaning metals for industrial purposes; detergents for industrial use; aluminum nitride ceramics, namely, ceramic powders and glazings for industrial purposes; photoresist chemicals, namely, photoresist for use in the manufacture of integrated circuits, semiconductor devices and other electronic devices; electron beam resist for use in the manufacture of integrated circuits, semiconductor devices and other electronic devices; developers being chemicals for removal of photoresist materials used in the manufacture of printed circuit boards ]
First Use Anywhere: 0
First Use in Commerce: 0

Additional Information

Color Claim
Color is not claimed as a feature of the mark.

Classification

International Classes
001