Legal Representation
Attorney
Jennifer Sheehan Anderson
USPTO Deadlines
Application History
26 events| Date | Code | Type | Description | Documents |
|---|---|---|---|---|
| Aug 9, 2010 | MAB6 | O | ABANDONMENT NOTICE MAILED - NO USE STATEMENT FILED | Loading... |
| Aug 9, 2010 | ABN6 | S | ABANDONMENT - NO USE STATEMENT FILED | Loading... |
| Dec 21, 2009 | EX5G | S | SOU EXTENSION 5 GRANTED | Loading... |
| Dec 18, 2009 | EXT5 | S | SOU EXTENSION 5 FILED | Loading... |
| Dec 18, 2009 | EEXT | I | SOU TEAS EXTENSION RECEIVED | Loading... |
| Jul 13, 2009 | EX4G | S | SOU EXTENSION 4 GRANTED | Loading... |
| Jun 18, 2009 | EXT4 | S | SOU EXTENSION 4 FILED | Loading... |
| Jul 13, 2009 | AITU | A | CASE ASSIGNED TO INTENT TO USE PARALEGAL | Loading... |
| Jun 18, 2009 | EEXT | I | SOU TEAS EXTENSION RECEIVED | Loading... |
| Jan 6, 2009 | EX3G | S | SOU EXTENSION 3 GRANTED | Loading... |
| Jan 6, 2009 | EXT3 | S | SOU EXTENSION 3 FILED | Loading... |
| Jan 6, 2009 | EEXT | I | SOU TEAS EXTENSION RECEIVED | Loading... |
| Jun 27, 2008 | EX2G | S | SOU EXTENSION 2 GRANTED | Loading... |
| Jun 27, 2008 | EXT2 | S | SOU EXTENSION 2 FILED | Loading... |
| Jun 27, 2008 | EEXT | I | SOU TEAS EXTENSION RECEIVED | Loading... |
| Jan 16, 2008 | EX1G | S | SOU EXTENSION 1 GRANTED | Loading... |
| Dec 19, 2007 | EXT1 | S | SOU EXTENSION 1 FILED | Loading... |
| Dec 19, 2007 | EEXT | I | SOU TEAS EXTENSION RECEIVED | Loading... |
| Jul 10, 2007 | NOAM | O | NOA MAILED - SOU REQUIRED FROM APPLICANT | Loading... |
| Apr 17, 2007 | PUBO | A | PUBLISHED FOR OPPOSITION | Loading... |
| Mar 28, 2007 | NPUB | O | NOTICE OF PUBLICATION | Loading... |
| Feb 28, 2007 | PREV | O | LAW OFFICE PUBLICATION REVIEW COMPLETED | Loading... |
| Feb 28, 2007 | ALIE | A | ASSIGNED TO LIE | Loading... |
| Jan 25, 2007 | CNSA | P | APPROVED FOR PUB - PRINCIPAL REGISTER | Loading... |
| Jan 25, 2007 | DOCK | D | ASSIGNED TO EXAMINER | Loading... |
| Sep 7, 2006 | NWAP | I | NEW APPLICATION ENTERED | Loading... |
Detailed Classifications
Class 001
Chemical source material for the deposition of thin films in the manufacturing of semiconductors
First Use Anywhere:
0
First Use in Commerce:
0
Classification
International Classes
001