STATMASK

Serial Number 78443613
606

Registration Progress

Application Filed
Jun 30, 2004
Under Examination
Aug 30, 2005
Approved for Publication
May 18, 2005
Published for Opposition
Jun 7, 2005
Registered

Trademark Image

STATMASK

Basic Information

Serial Number
78443613
Filing Date
June 30, 2004
Published for Opposition
June 7, 2005
Abandonment Date
August 29, 2006
Drawing Code
4000

Status Summary

Current Status
Inactive
Status Code
606
Status Date
Aug 29, 2006
Classes
009

Rights Holder

Photronics, Inc.

03
Address
15 Secor Road
Brookfield, CT 06804

Ownership History

Photronics, Inc.

Original Applicant
03
Brookfield, CT

Photronics, Inc.

Owner at Publication
03
Brookfield, CT

Legal Representation

Attorney
William C. Crutcher

USPTO Deadlines

All Deadlines Cleared

All 2 deadline(s) have been cleared by subsequent events. No active deadlines at this time.

Application History

16 events
Date Code Type Description Documents
Nov 1, 2006 ABN6 S ABANDONMENT - NO USE STATEMENT FILED Loading...
Nov 1, 2006 MAB6 O ABANDONMENT NOTICE MAILED - NO USE STATEMENT FILED Loading...
Feb 28, 2006 EEXT I SOU TEAS EXTENSION RECEIVED Loading...
Feb 28, 2006 EXT1 S SOU EXTENSION 1 FILED Loading...
Feb 28, 2006 EX1G S SOU EXTENSION 1 GRANTED Loading...
Aug 30, 2005 NOAM O NOA MAILED - SOU REQUIRED FROM APPLICANT Loading...
Jun 7, 2005 PUBO A PUBLISHED FOR OPPOSITION Loading...
May 18, 2005 NPUB O NOTICE OF PUBLICATION Loading...
Feb 22, 2005 ALIE A ASSIGNED TO LIE Loading...
Feb 22, 2005 PREV O LAW OFFICE PUBLICATION REVIEW COMPLETED Loading...
Feb 11, 2005 CNSA P APPROVED FOR PUB - PRINCIPAL REGISTER Loading...
Feb 10, 2005 XAEC I EXAMINER'S AMENDMENT ENTERED Loading...
Feb 8, 2005 CNEA R EXAMINERS AMENDMENT -WRITTEN Loading...
Feb 8, 2005 GNEA F EXAMINERS AMENDMENT E-MAILED Loading...
Feb 4, 2005 DOCK D ASSIGNED TO EXAMINER Loading...
Jul 8, 2004 NWAP I NEW APPLICATION ENTERED Loading...

Detailed Classifications

Class 009
Providing a web site for clients to obtain statistical and other technical data relating to their production orders in the field of photomasks and reticles
First Use Anywhere: 0
First Use in Commerce: 0

Additional Information

Pseudo Mark
STATISTICAL MASK

Classification

International Classes
009