Legal Representation
Attorney
Geoffrey L. Chase
USPTO Deadlines
Application History
26 eventsDate | Code | Type | Description | Documents |
---|---|---|---|---|
Mar 22, 2017 | ASGN | I | AUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP | Loading... |
May 9, 2007 | ABN6 | S | ABANDONMENT - NO USE STATEMENT FILED | Loading... |
May 9, 2007 | MAB6 | O | ABANDONMENT NOTICE MAILED - NO USE STATEMENT FILED | Loading... |
Sep 20, 2006 | EX5G | S | SOU EXTENSION 5 GRANTED | Loading... |
Aug 28, 2006 | EEXT | I | SOU TEAS EXTENSION RECEIVED | Loading... |
Aug 28, 2006 | EXT5 | S | SOU EXTENSION 5 FILED | Loading... |
Mar 17, 2006 | EX4G | S | SOU EXTENSION 4 GRANTED | Loading... |
Mar 1, 2006 | EEXT | I | SOU TEAS EXTENSION RECEIVED | Loading... |
Mar 1, 2006 | EXT4 | S | SOU EXTENSION 4 FILED | Loading... |
Aug 19, 2005 | EX3G | S | SOU EXTENSION 3 GRANTED | Loading... |
Aug 15, 2005 | EEXT | I | SOU TEAS EXTENSION RECEIVED | Loading... |
Aug 15, 2005 | EXT3 | S | SOU EXTENSION 3 FILED | Loading... |
Mar 24, 2005 | EX2G | S | SOU EXTENSION 2 GRANTED | Loading... |
Mar 1, 2005 | EEXT | I | SOU TEAS EXTENSION RECEIVED | Loading... |
Mar 1, 2005 | EXT2 | S | SOU EXTENSION 2 FILED | Loading... |
Sep 4, 2004 | EX1G | S | SOU EXTENSION 1 GRANTED | Loading... |
Aug 23, 2004 | EEXT | I | SOU TEAS EXTENSION RECEIVED | Loading... |
Aug 23, 2004 | EXT1 | S | SOU EXTENSION 1 FILED | Loading... |
Mar 2, 2004 | NOAM | O | NOA MAILED - SOU REQUIRED FROM APPLICANT | Loading... |
Dec 9, 2003 | PUBO | A | PUBLISHED FOR OPPOSITION | Loading... |
Nov 19, 2003 | NPUB | O | NOTICE OF PUBLICATION | Loading... |
Oct 14, 2003 | CNSA | P | APPROVED FOR PUB - PRINCIPAL REGISTER | Loading... |
Sep 22, 2003 | EMRV | E | EMAIL RECEIVED | Loading... |
Sep 17, 2003 | CRFA | I | CORRESPONDENCE RECEIVED IN LAW OFFICE | Loading... |
Sep 11, 2003 | GNRT | F | NON-FINAL ACTION E-MAILED | Loading... |
Sep 5, 2003 | DOCK | D | ASSIGNED TO EXAMINER | Loading... |
Detailed Classifications
Class 001
Lithographic chemicals, namely, aqueous chemicals for rinsing or conditioning photoresist in lithographic processing in electronics fabrication
First Use Anywhere:
0
First Use in Commerce:
0
Additional Information
Pseudo Mark
OPTIMUM RINSE
Classification
International Classes
001