C P-LOK

Serial Number 77192004
606

Registration Progress

Application Filed
May 29, 2007
Under Examination
Feb 12, 2008
Approved for Publication
Oct 31, 2007
Published for Opposition
Nov 20, 2007
Registered

Trademark Image

C P-LOK

Basic Information

Serial Number
77192004
Filing Date
May 29, 2007
Published for Opposition
November 20, 2007
Abandonment Date
March 16, 2009
Drawing Code
4000

Status Summary

Current Status
Inactive
Status Code
606
Status Date
Mar 16, 2009
Classes
001

Rights Holder

VERSUM MATERIALS US, LLC

16
Address
8555 RIVER PARKWAY
TEMPE, AZ 85284

Ownership History

Air Products and Chemicals, Inc.

Original Applicant
03
Allentown, PA

Air Products and Chemicals, Inc.

Owner at Publication
03
Allentown, PA

VERSUM MATERIALS US, LLC

New Owner After Publication #1
16
TEMPE, AZ

Legal Representation

Attorney
Geoffrey L. Chase

USPTO Deadlines

All Deadlines Cleared

All 5 deadline(s) have been cleared by subsequent events. No active deadlines at this time.

Application History

21 events
Date Code Type Description Documents
Mar 22, 2017 ASGN I AUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP Loading...
Mar 16, 2009 ABN6 S ABANDONMENT - NO USE STATEMENT FILED Loading...
Mar 16, 2009 MAB6 O ABANDONMENT NOTICE MAILED - NO USE STATEMENT FILED Loading...
Aug 7, 2008 EEXT I SOU TEAS EXTENSION RECEIVED Loading...
Aug 7, 2008 EXT1 S SOU EXTENSION 1 FILED Loading...
Aug 7, 2008 EX1G S SOU EXTENSION 1 GRANTED Loading...
Feb 12, 2008 NOAM O NOA MAILED - SOU REQUIRED FROM APPLICANT Loading...
Nov 20, 2007 PUBO A PUBLISHED FOR OPPOSITION Loading...
Oct 31, 2007 NPUB O NOTICE OF PUBLICATION Loading...
Oct 17, 2007 ALIE A ASSIGNED TO LIE Loading...
Oct 17, 2007 PREV O LAW OFFICE PUBLICATION REVIEW COMPLETED Loading...
Sep 17, 2007 CNEA R EXAMINERS AMENDMENT -WRITTEN Loading...
Sep 17, 2007 GNEA O EXAMINERS AMENDMENT E-MAILED Loading...
Sep 17, 2007 GNEN O NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED Loading...
Sep 17, 2007 XAEC I EXAMINER'S AMENDMENT ENTERED Loading...
Sep 17, 2007 CNSA P APPROVED FOR PUB - PRINCIPAL REGISTER Loading...
Aug 15, 2007 CNRT R NON-FINAL ACTION WRITTEN Loading...
Aug 15, 2007 GNRT F NON-FINAL ACTION E-MAILED Loading...
Aug 15, 2007 GNRN O NOTIFICATION OF NON-FINAL ACTION E-MAILED Loading...
Aug 8, 2007 DOCK D ASSIGNED TO EXAMINER Loading...
Jun 4, 2007 NWAP I NEW APPLICATION ENTERED Loading...

Detailed Classifications

Class 001
Chemicals for use in the manufacture of low dielectric insulating film for use in semiconductors and integrated circuits; chemicals in the nature of porogens, namely, decomposing chemicals for forming pores in low dielectric insulating film; post chemical mechanical planarization (CMP) cleaning chemical preparations for removing slurries and polishing debris
First Use Anywhere: 0
First Use in Commerce: 0

Classification

International Classes
001