CLEANTECH

Serial Number 77140254
Registration 3347823
710

Registration Progress

Application Filed
Mar 26, 2007
Under Examination
Approved for Publication
Aug 29, 2007
Published for Opposition
Sep 18, 2007
Registered
Dec 4, 2007

Trademark Image

CLEANTECH

Basic Information

Serial Number
77140254
Registration Number
3347823
Filing Date
March 26, 2007
Registration Date
December 4, 2007
Published for Opposition
September 18, 2007
Cancellation Date
July 11, 2014
Drawing Code
3000

Status Summary

Current Status
Inactive
Status Code
710
Status Date
Jul 11, 2014

Rights Holder

Cleantech Group LLC

16
Address
3415 Rafferty Road
Howell, MI 48843

Ownership History

Cleantech Venture Network LLC

Original Applicant
16
Howell, MI

CLEANTECH NETWORK LLC

New Owner Before Publication #1
16
HOWELL, MI

CLEANTECH NETWORK LLC

Owner at Publication
16
HOWELL, MI

CLEANTECH NETWORK LLC

Original Registrant
16
HOWELL, MI

Cleantech Group LLC

New Owner After Registration #1
16
Howell, MI

Legal Representation

Attorney
Jeremy D. Bisdorf

USPTO Deadlines

Next Deadline
853 days remaining
Section 8 & 9 (20-Year) Renewal Due (Based on registration date 2007-12-04)
Due Date
December 04, 2027
Grace Period Ends
June 04, 2028

Application History

13 events
Date Code Type Description Documents
Jul 11, 2014 C8.. O CANCELLED SEC. 8 (6-YR) Loading...
Nov 27, 2013 ASCK I ASSIGNMENT OF OWNERSHIP NOT UPDATED AUTOMATICALLY Loading...
Dec 4, 2007 R.PR A REGISTERED-PRINCIPAL REGISTER Loading...
Sep 18, 2007 PUBO A PUBLISHED FOR OPPOSITION Loading...
Aug 29, 2007 NPUB O NOTICE OF PUBLICATION Loading...
Aug 22, 2007 ASCK I ASSIGNMENT OF OWNERSHIP NOT UPDATED AUTOMATICALLY Loading...
Aug 15, 2007 ALIE A ASSIGNED TO LIE Loading...
Aug 15, 2007 PREV O LAW OFFICE PUBLICATION REVIEW COMPLETED Loading...
Aug 8, 2007 ASGN I AUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP Loading...
Jun 30, 2007 CNSA O APPROVED FOR PUB - PRINCIPAL REGISTER Loading...
Jun 27, 2007 DOCK D ASSIGNED TO EXAMINER Loading...
Mar 30, 2007 MDSM O NOTICE OF DESIGN SEARCH CODE MAILED Loading...
Mar 29, 2007 NWAP I NEW APPLICATION ENTERED Loading...

Additional Information

Design Mark
The mark consists of three polygons to the left of the word portion of the mark, with a stylized sun in the large center polygon, stylized waves in the upper polygon and the image of suds in the lower polygon.
Pseudo Mark
CLEAN TECH