Legal Representation
Attorney
Allston L. Jones
USPTO Deadlines
Application History
18 events| Date | Code | Type | Description | Documents |
|---|---|---|---|---|
| Mar 12, 2007 | MAB6 | O | ABANDONMENT NOTICE MAILED - NO USE STATEMENT FILED | Loading... |
| Mar 12, 2007 | ABN6 | S | ABANDONMENT - NO USE STATEMENT FILED | Loading... |
| Jul 20, 2006 | EX1G | S | SOU EXTENSION 1 GRANTED | Loading... |
| Jun 19, 2006 | EXT1 | S | SOU EXTENSION 1 FILED | Loading... |
| Jun 19, 2006 | I | PAPER RECEIVED | Loading... | |
| Dec 27, 2005 | NOAM | O | NOA MAILED - SOU REQUIRED FROM APPLICANT | Loading... |
| Oct 4, 2005 | PUBO | A | PUBLISHED FOR OPPOSITION | Loading... |
| Sep 14, 2005 | NPUB | O | NOTICE OF PUBLICATION | Loading... |
| Jun 17, 2005 | PREV | O | LAW OFFICE PUBLICATION REVIEW COMPLETED | Loading... |
| Jun 3, 2005 | ALIE | A | ASSIGNED TO LIE | Loading... |
| Jun 1, 2005 | CNSA | P | APPROVED FOR PUB - PRINCIPAL REGISTER | Loading... |
| May 26, 2005 | ACEC | I | AMENDMENT FROM APPLICANT ENTERED | Loading... |
| May 17, 2005 | CRFA | I | CORRESPONDENCE RECEIVED IN LAW OFFICE | Loading... |
| May 17, 2005 | I | PAPER RECEIVED | Loading... | |
| Nov 15, 2004 | CNRT | F | NON-FINAL ACTION MAILED | Loading... |
| Nov 13, 2004 | CNRT | R | NON-FINAL ACTION WRITTEN | Loading... |
| Oct 31, 2004 | DOCK | D | ASSIGNED TO EXAMINER | Loading... |
| Apr 30, 2004 | NWAP | I | NEW APPLICATION ENTERED | Loading... |
Detailed Classifications
Class 007
heat treating, cleaning, etching, implanting and leveling machines, and parts and tooling therefore, for use in the production of semiconductors and flat panel displays; and operating manuals sold as a unit with heat treating, cleaning, etching, implanting and leveling machines
First Use Anywhere:
0
First Use in Commerce:
0
Class 009
Stepper, scanner and full-field, laser processing and implanting machines, and illumination, inspection and measurement apparatus, tooling and parts therefore, for processing or implanting wafers, flat panel displays and other substrates; electron-beam systems, and illumination, inspection and measurement apparatus, tooling and parts therefore, for processing semiconductor wafers, flat panel displays and other substrates; reticles and masks for use with said stepper, scanner and full field laser processing and implanting machines and electron-beam systems for use in manufacturing said semiconductor wafers, flat panel displays and other substrates, wherein said reticles and masks contain the pattern to be processed on said semiconductor wafer, flat panel display and other substrates; specialized optical components, substrate, reticle and mask transport stages for use in manufacturing semiconductor wafers, flat panel displays and other substrates; computer software for use in controlling, and used with, heat treating, cleaning, etching, stepper, scanner and full field laser processing, implanting and leveling machines, and electron-beam systems for manufacturing semiconductor wafers, flat panel displays and other substrates; replacement parts and consumable materials for, and manuals delivered with, the aforesaid goods
First Use Anywhere:
0
First Use in Commerce:
0
Classification
International Classes
007
009