Legal Representation
Attorney
Chinh H. Pham
USPTO Deadlines
Application History
12 events| Date | Code | Type | Description | Documents |
|---|---|---|---|---|
| Dec 15, 2005 | MAB2 | O | ABANDONMENT NOTICE MAILED - FAILURE TO RESPOND | Loading... |
| Dec 14, 2005 | ABN2 | O | ABANDONMENT - FAILURE TO RESPOND OR LATE RESPONSE | Loading... |
| Dec 14, 2005 | DOCK | D | ASSIGNED TO EXAMINER | Loading... |
| May 16, 2005 | CNFR | O | FINAL REFUSAL MAILED | Loading... |
| May 13, 2005 | CNFR | R | FINAL REFUSAL WRITTEN | Loading... |
| May 6, 2005 | ACEC | I | AMENDMENT FROM APPLICANT ENTERED | Loading... |
| Apr 26, 2005 | CRFA | I | CORRESPONDENCE RECEIVED IN LAW OFFICE | Loading... |
| Apr 26, 2005 | I | PAPER RECEIVED | Loading... | |
| Oct 26, 2004 | CNRT | F | NON-FINAL ACTION MAILED | Loading... |
| Oct 25, 2004 | CNRT | R | NON-FINAL ACTION WRITTEN | Loading... |
| Oct 20, 2004 | DOCK | D | ASSIGNED TO EXAMINER | Loading... |
| Apr 16, 2004 | NWAP | I | NEW APPLICATION ENTERED | Loading... |
Detailed Classifications
Class 040
APPLICATION OF COATING, NAMELY, ULTRATHIN COATINGS ONTO POLYMER SUBSTRATES, INORGANIC MATERIAL ONTO A POLYMER SUBSTRATE, NANOSCALE MATERIAL ONTO A POLYMER SUBSTRATE, ULTRATHIN COATING ONTO THE SURFACES OF A POLYMER USING ATOMIC LAYER DEPOSITION, NANOSCALE INORGANIC DEPOSITS ON AN ORGANIC POLYMER USING ATOMIC LAYER DEPOSITION; CUSTOM MANUFACTURING, TO THE ORDER AND SPECIFICATIONS OF OTHERS, POLYMER SUBSTRATES HAVING NANOSCALE INORGANIC MATERIAL DEPOSITS
First Use Anywhere:
0
First Use in Commerce:
0
Additional Information
Pseudo Mark
POLYMER ATOMIC LAYER DEPOSITION
Classification
International Classes
040