Legal Representation
Attorney
Chinh H. Pham
USPTO Deadlines
Application History
12 events| Date | Code | Type | Description | Documents |
|---|---|---|---|---|
| Feb 6, 2006 | MAB2 | O | ABANDONMENT NOTICE MAILED - FAILURE TO RESPOND | Loading... |
| Feb 6, 2006 | ABN2 | O | ABANDONMENT - FAILURE TO RESPOND OR LATE RESPONSE | Loading... |
| Feb 4, 2006 | DOCK | D | ASSIGNED TO EXAMINER | Loading... |
| May 16, 2005 | CNFR | O | FINAL REFUSAL MAILED | Loading... |
| May 16, 2005 | CNFR | R | FINAL REFUSAL WRITTEN | Loading... |
| May 3, 2005 | ACEC | I | AMENDMENT FROM APPLICANT ENTERED | Loading... |
| Apr 26, 2005 | CRFA | I | CORRESPONDENCE RECEIVED IN LAW OFFICE | Loading... |
| Apr 26, 2005 | I | PAPER RECEIVED | Loading... | |
| Oct 28, 2004 | CNRT | F | NON-FINAL ACTION MAILED | Loading... |
| Oct 28, 2004 | CNRT | R | NON-FINAL ACTION WRITTEN | Loading... |
| Oct 20, 2004 | DOCK | D | ASSIGNED TO EXAMINER | Loading... |
| Apr 16, 2004 | NWAP | I | NEW APPLICATION ENTERED | Loading... |
Detailed Classifications
Class 040
application of coating, namely, utlrathin material onto particles, application of coating onto nanoscale particulate matter, application of coating onto nanoscale particulate matter through the use of atomic layer deposition; manufacture of coated nanoscale particulate materials, namely, inorganic particulate materials having an ultrathin coating, to the order and specifications of others
First Use Anywhere:
0
First Use in Commerce:
0
Additional Information
Pseudo Mark
PARTICLE ATOMIC LAYER DEPOSITION
Classification
International Classes
040