Legal Representation
Attorney
ERIN E GIACOPPO
USPTO Deadlines
Application History
13 events| Date | Code | Type | Description | Documents |
|---|---|---|---|---|
| Sep 9, 2001 | ABN6 | S | ABANDONMENT - NO USE STATEMENT FILED | Loading... |
| Nov 28, 2000 | NOAM | O | NOA MAILED - SOU REQUIRED FROM APPLICANT | Loading... |
| Sep 5, 2000 | PUBO | A | PUBLISHED FOR OPPOSITION | Loading... |
| Aug 4, 2000 | NPUB | O | NOTICE OF PUBLICATION | Loading... |
| Jun 23, 2000 | CNSA | P | APPROVED FOR PUB - PRINCIPAL REGISTER | Loading... |
| Jun 12, 2000 | CNEA | F | EXAMINER'S AMENDMENT MAILED | Loading... |
| Apr 26, 2000 | CRFA | I | CORRESPONDENCE RECEIVED IN LAW OFFICE | Loading... |
| Oct 21, 1999 | CNRT | F | NON-FINAL ACTION MAILED | Loading... |
| Aug 26, 1999 | CRFA | I | CORRESPONDENCE RECEIVED IN LAW OFFICE | Loading... |
| Feb 26, 1999 | CNRT | F | NON-FINAL ACTION MAILED | Loading... |
| Feb 25, 1999 | DOCK | D | ASSIGNED TO EXAMINER | Loading... |
| Feb 23, 1999 | DOCK | D | ASSIGNED TO EXAMINER | Loading... |
| Feb 10, 1999 | DOCK | D | ASSIGNED TO EXAMINER | Loading... |
Detailed Classifications
Class 007
Semiconductor manufacturing machines, namely plasma photoresist removal systems, plasma etch systems and wet process machines for removing surface residues from semiconductor wafers
First Use Anywhere:
0
First Use in Commerce:
0
Additional Information
Design Mark
The mark consists of the terms "INTEGRATED CLEAN" within a rectangle containing a miscellaneous design.
Pseudo Mark
INTEGRATED CLEAN
Classification
International Classes
007