Legal Representation
Attorney
G E Marshall
USPTO Deadlines
Application History
9 events| Date | Code | Type | Description | Documents |
|---|---|---|---|---|
| Dec 1, 2000 | ABN6 | S | ABANDONMENT - NO USE STATEMENT FILED | Loading... |
| Dec 1, 1999 | EXT1 | S | SOU EXTENSION 1 FILED | Loading... |
| Dec 1, 1999 | EX1G | S | SOU EXTENSION 1 GRANTED | Loading... |
| Jun 1, 1999 | NOAM | O | NOA MAILED - SOU REQUIRED FROM APPLICANT | Loading... |
| Mar 9, 1999 | PUBO | A | PUBLISHED FOR OPPOSITION | Loading... |
| Feb 5, 1999 | NPUB | O | NOTICE OF PUBLICATION | Loading... |
| Dec 4, 1998 | CNSA | P | APPROVED FOR PUB - PRINCIPAL REGISTER | Loading... |
| Nov 20, 1998 | CNEA | F | EXAMINER'S AMENDMENT MAILED | Loading... |
| Nov 13, 1998 | DOCK | D | ASSIGNED TO EXAMINER | Loading... |
Detailed Classifications
Class 042
Evaluation, testing and development of photolithographic masks used in the manufacture of semiconductor products
First Use Anywhere:
0
First Use in Commerce:
0
Additional Information
Pseudo Mark
LENS SWEEPER
Classification
International Classes
042