Legal Representation
Attorney
Jay G. Durst
USPTO Deadlines
Next Deadline
867 days remaining
Section 8 & 9 Renewal Due (Principal Register) (Based on registration date 19980623)
Due Date
June 23, 2028
Grace Period Ends
December 23, 2028
Application History
25 events| Date | Code | Type | Description | Documents |
|---|---|---|---|---|
| Jun 23, 2022 | ASCK | I | ASSIGNMENT OF OWNERSHIP NOT UPDATED AUTOMATICALLY | Loading... |
| Jan 26, 2022 | ASCK | I | ASSIGNMENT OF OWNERSHIP NOT UPDATED AUTOMATICALLY | Loading... |
| Feb 12, 2020 | ASGN | I | AUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP | Loading... |
| Jul 6, 2018 | NA89 | E | NOTICE OF ACCEPTANCE OF SEC. 8 & 9 - E-MAILED | Loading... |
| Jul 6, 2018 | RNL2 | Q | REGISTERED AND RENEWED (SECOND RENEWAL - 10 YRS) | Loading... |
| Jul 6, 2018 | 89AG | O | REGISTERED - SEC. 8 (10-YR) ACCEPTED/SEC. 9 GRANTED | Loading... |
| Jul 6, 2018 | APRE | A | CASE ASSIGNED TO POST REGISTRATION PARALEGAL | Loading... |
| Jun 25, 2018 | E89R | I | TEAS SECTION 8 & 9 RECEIVED | Loading... |
| May 24, 2018 | ARAA | I | ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED | Loading... |
| May 24, 2018 | REAP | I | TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED | Loading... |
| Jun 21, 2008 | RNL1 | Q | REGISTERED AND RENEWED (FIRST RENEWAL - 10 YRS) | Loading... |
| Jun 21, 2008 | 89AG | O | REGISTERED - SEC. 8 (10-YR) ACCEPTED/SEC. 9 GRANTED | Loading... |
| Jun 19, 2008 | PLGL | A | ASSIGNED TO PARALEGAL | Loading... |
| Jun 10, 2008 | 89AF | I | REGISTERED - COMBINED SECTION 8 (10-YR) & SEC. 9 FILED | Loading... |
| Jun 10, 2008 | I | PAPER RECEIVED | Loading... | |
| Aug 17, 2007 | CFIT | O | CASE FILE IN TICRS | Loading... |
| Jan 13, 2004 | C15A | O | REGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK. | Loading... |
| Oct 3, 2003 | 815F | I | REGISTERED - SEC. 8 (6-YR) & SEC. 15 FILED | Loading... |
| Jun 23, 1998 | R.PR | A | REGISTERED-PRINCIPAL REGISTER | Loading... |
| Mar 31, 1998 | PUBO | A | PUBLISHED FOR OPPOSITION | Loading... |
| Feb 27, 1998 | NPUB | O | NOTICE OF PUBLICATION | Loading... |
| Jan 27, 1998 | CNSA | O | APPROVED FOR PUB - PRINCIPAL REGISTER | Loading... |
| Jan 12, 1998 | CRFA | I | CORRESPONDENCE RECEIVED IN LAW OFFICE | Loading... |
| Dec 8, 1997 | CNRT | F | NON-FINAL ACTION MAILED | Loading... |
| Nov 21, 1997 | DOCK | D | ASSIGNED TO EXAMINER | Loading... |
Detailed Classifications
Class 009
photolithographic machines for manufacturing semiconductor wafers and other substrates; reticles and masks for use with said photolithographic machines in manufacturing said semiconductor wafers and other substrates, wherein said reticles and masks contain the pattern to be printed on said semiconductor wafer and other substrates; specialized optical lenses, wafer, reticle and mask transport stages and wafer index tooling for use in manufacturing semiconductor wafers and other substrates; computer software for use in operating photolithographic machines for manufacturing semiconductor wafers and other substrates; and replacement parts and consumable materials for the aforesaid goods
First Use Anywhere:
19811200
First Use in Commerce:
19811200
Class 016
operation, instruction and training manuals, and printed forms for use with photolithographic machines for manufacturing semiconductor wafers and other substrates, specialized optical lenses, wafer, reticle and mask transport stages and wafer index tooling for use in manufacturing semiconductor wafers and other substrates, and computer software for use in operating photolithographic machines for manufacturing semiconductor wafers and other substrates
First Use Anywhere:
19791100
First Use in Commerce:
19791100
Class 037
repair services for photolithographic machines for manufacturing semiconductor wafers and other substrates, specialized optical lenses, wafer, reticle and mask transport stages and wafer index tooling for use in manufacturing semiconductor wafers and other substrates
First Use Anywhere:
19791200
First Use in Commerce:
19791200
Class 041
educational services, namely, conducting training courses in the use of photolithographic machines for manufacturing semiconductor wafers and other substrates, reticles and masks for use with said photolithographic machines in manufacturing said semiconductor wafers and other substrates, specialized optical lenses, wafer, reticle and mask transport stages and wafer index tooling for use in manufacturing semiconductor wafers and other substrates, and computer software for use in operating photolithographic machines for manufacturing semiconductor wafers and other substrates
First Use Anywhere:
19791100
First Use in Commerce:
19791100
Additional Information
Pseudo Mark
ULTRA-TECH
Classification
International Classes
009
016
037
041